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Fundamentals of Semiconductor Fabrication, May

Fundamentals of Semiconductor Fabrication

Автор: May
Название:  Fundamentals of Semiconductor Fabrication   (Основы производства полупроводников)
Издательство: Wiley
Классификация:
Электронная техника

ISBN: 0471232793
ISBN-13(EAN): 9780471232797
ISBN: 0-471-23279-3
ISBN-13(EAN): 978-0-471-23279-7
Обложка/Формат: Paperback
Страницы: 320
Вес: 0.585 кг.
Дата издания: 28.08.2007
Серия: Components & Devices
Язык: ENG
Иллюстрации: Illustrations
Размер: 26.01 x 18.29 x 1.75 cm
Читательская аудитория: Professional & vocational
Ссылка на Издательство: Link
Рейтинг:
Поставляется из: Англии
Описание: From crystal growth to integrated devices and circuits, this new book offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical aspects of all major steps in the fabrication sequence.
Дополнительное описание: Paperback 320 pages August 2007


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Printed circuit boards; design, fabrication and assembly

Автор: Khandpur
Название: Printed circuit boards; design, fabrication and assembly
ISBN: 0071464204 ISBN-13(EAN): 9780071464208
Издательство: McGraw-Hill
Цена: 5719 р.
Наличие на складе: Есть у поставщика.Поставка под заказ.
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Electronic Assembly Fabrication

Автор: Charles Harper
Название: Electronic Assembly Fabrication
ISBN: 0071378820 ISBN-13(EAN): 9780071378826
Издательство: McGraw-Hill
Цена: 3871 р.
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Plasma Processes for Semiconductor Fabrication

Автор: W. N. G. Hitchon
Название: Plasma Processes for Semiconductor Fabrication
ISBN: 0521018005 ISBN-13(EAN): 9780521018005
Издательство: Cambridge Academ
Цена: 5609 р.
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Описание: Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry.
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Microchip Fabrication: A Practical Guide to Semiconductor Pr

Автор: Van Zant Peter
Название: Microchip Fabrication: A Practical Guide to Semiconductor Pr
ISBN: 0071821015 ISBN-13(EAN): 9780071821018
Издательство: McGraw-Hill
Цена: 7127 р.
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Micro Process Engineering: Fundamentals, Devices, Fabrication, and Applications

Автор: Norbert Kockmann
Название: Micro Process Engineering: Fundamentals, Devices, Fabrication, and Applications
ISBN: 3527312463 ISBN-13(EAN): 9783527312467
Издательство: Wiley
Цена: 20680 р.
Наличие на складе: Нет в наличии.
Описание: "Advanced Micro and Nanosystems (AMN)" provides cutting-edge reviews and detailed case studies by top authors from science and industry, covering technologies, devices and advanced systems from the micro and nano worlds, which together have an immense innovative application potential that opens up with control of shape and function from the atomic level right up to the visible world without any technological gaps. In this topical volume, authors from leading industrial players and research institutions present a concise and didactical introduction to Micro Process Engineering, the combination of microtechnology and process engineering into a most promising and powerful tool for revolutionizing chemical processes and industrial mass production of bulk materials, fine chemicals, pharmaceuticals and many other products. The book takes the readers from the fundamentals of engineering methods, transport processes, and fluid dynamics to device conception, simulation and modelling, control interfaces and issues of modularity and compatibility. Fabrication strategies and techniques are examined next, focused on the fabrication of suitable microcomponents from various materials such as metals, polymers, silicon, ceramics and glass. The book concludes with actual applications and operational aspects of micro process systems, giving broad coverage to industrial efforts in America, Europe and Asia as well as laboratory equipment and education.
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The Physics of Micro/Nano-Fabrication

Автор: Brodie
Название: The Physics of Micro/Nano-Fabrication
ISBN: 0306441462 ISBN-13(EAN): 9780306441462
Издательство: Springer
Цена: 13086 р.
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Описание: Provides an overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. This book is intended for students, specialists within the field, and researchers in related fields.
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Photonic Crystals / Physics, Fabrication and Applications

Автор: Inoue K., Ohtaka K.
Название: Photonic Crystals / Physics, Fabrication and Applications
ISBN: 3540205594 ISBN-13(EAN): 9783540205593
Издательство: Springer
Цена: 11931 р.
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Описание: Kuon INOUE; PhD (The University of Tokyo):1961 graduation from The University of Tokyo, Department of Applied Physics, Photonic Crystals details recent progress in the study of photonic crystals, ranging from fundamental aspects to up-to-date applications, in one unified treatment. It covers most of the worldwide frontier fields in photonic crystals, including up-to-date fabrication techniques, recent and future technological applications, and our basic understanding of the various optical properties of photonic crystals. Brand-new theoretical and experimental data are also presented. The book is intended for graduate course students and specialists actively working in this field, but it will also be useful for newcomers, especially the extensive chapter dealing with fundamental aspects of photonic crystals, which paves the way to a full appreciation of the other topics addressed.
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Frontiers in Planar Lightwave Circuit Technology / Design, Simulation, and Fabrication

Автор: Janz Siegfried, Ctyroky Jiri, Tanev Stoyan
Название: Frontiers in Planar Lightwave Circuit Technology / Design, Simulation, and Fabrication
ISBN: 1402041640 ISBN-13(EAN): 9781402041648
Издательство: Springer
Цена: 16093 р.
Наличие на складе: Есть у поставщика.Поставка под заказ.
Описание: This book is the result of the NATO Advanced Research Workshop on Frontiers in Planar Lightwave Circuit Technology, which took place in Ottawa, Canada from September 21-25, 2004. Many of the world’s leading experts in integrated photonic design, theory and experiment were invited to give lectures in their fields of expertise, and participate in discussions on current research and applications, as well as the new directions planar lightwave circuit technology is evolving towards. The sum of their contributions to this book constitutes an excellent record of many key issues and scientific problems in planar lightwave circuit research at the time of writing. In this volume the reader will find detailed overviews of experimental and theoretical work in high index contrast waveguide systems, micro-optical resonators, nonlinear optics, and advanced optical simulation methods, as well as articles describing emerging applications of integrated optics for medical and biological applications.
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Optical Micro-Resonators / Theory, Fabrication, and Applications

Автор: Grover Rohit, Heebner John , Ibrahim Tarek
Название: Optical Micro-Resonators / Theory, Fabrication, and Applications
ISBN: 0387730672 ISBN-13(EAN): 9780387730677
Издательство: Springer
Цена: 8466 р.
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Описание: Optical Micro-Resonators are an exciting new field of research that has gained prominence in the past few years due to the emergence of new fabrication technologies. This book is the first detailed text on the theory, fabrication, and applications of optical micro-resonators, and will be found useful by both graduate students and researchers in the field.
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Fabrication Methods for Precision Optics

Автор: Hank H. Karow
Название: Fabrication Methods for Precision Optics
ISBN: 0471703796 ISBN-13(EAN): 9780471703792
Издательство: Wiley
Цена: 7212 р.
Наличие на складе: Есть у поставщика.Поставка под заказ.
Описание: Based on an unpublished revision of the standard reference in the German optics industry. Designed as a source of facts, data and definitions, it reflects state--of--the--art technology and current practices in the United States and abroad. Practical in nature, it presents optical engineers with comprehensive coverage of material, tool and design methods and testing of the final product. Easily accessible with tables, graphs and equations, it will help professionals quickly and accurately find the most suitable solutions to their optical challenges.
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Integrated Modeling of Chemical Mechanical Planarization for Sub-Micron IC Fabrication: / From Particle Scale to Feature, Die and Wafer Scales

Автор: Luo Jianfeng, Dornfeld David
Название: Integrated Modeling of Chemical Mechanical Planarization for Sub-Micron IC Fabrication: / From Particle Scale to Feature, Die and Wafer Scales
ISBN: 354022369X ISBN-13(EAN): 9783540223696
Издательство: Springer
Цена: 10391 р.
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Описание: This book is the product of a developing research focus on CMP at Berkeley. Its focus is on the important area of process models which have not kept pace with the tremendous expansion of applications of CMP. It specifically deals with the development of models with sufficient detail to allow the evaluation and tradeoff of process inputs and parameters to assess impact on quality or quantity of production. The important role of the mechanical elements of the process are included in such an "integrated model". The objective of the book is to introduce some background on the overlooked mechanical aspects of the process - including pad surface topography and abrasive particles. The "integrated model" can be particularly useful as one looks towards optimization of the process, design of consumables and, importantly, looking to minimize the environmental affects of CMP.
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Science & Engineering Of Micrelectronic Fabrication 2E

Автор: Campbell
Название: Science & Engineering Of Micrelectronic Fabrication 2E
ISBN: 0195136055 ISBN-13(EAN): 9780195136050
Издательство: Oxford Academ
Цена: 3505 р.
Наличие на складе: Нет в наличии.
Описание: "The Science and Engineering of Microelectronic Fabrication" provides a thorough introduction to the field of microelectronic processing. Geared toward a wide audience, it may be used for upper-level undergraduate or first year graduate courses and as a handy reference for professionals. The text covers all the basic unit processes used to fabricate integrated circuits, including photolithography, plma and reactive ion etching, ion implantation, diffusion, oxidation, evaporation, vapor phase epitaxial growth, sputtering, and chemical vapor deposition. Advanced processing topics such as rapid thermal processing, non-optical lithography, molecular beam epitaxy, and metal organic chemical vapor deposition are also presented. The physics and chemistry of each process is introduced along with descriptions of the equipment used for the manufacturing of integrated circuits. The text also discusses the integration of these processes into common technologies such as CMOS, double poly bipolar, and GaAs MESFETs. Complexity/performance tradeoffs are evaluated along with a description of the current state-of-the-art devices. Each chapter includes sample problems with solutions. The text makes use of the process simulation package SUPREM to demonstrate impurity profiles of practical interest. The new edition includes complete chapter coverage of MEMS including: Fundamentals of Mechanics, Stress in Thin Films, Mechanical to Electrical Transduction, Mechanics of Common MEMS Devices, Bulk Micromachining Etching Techniques, Bulk Micromachining Process Flow, Surface Micromachining Basics, Surface Micromachining Process Flow, MEMS Actuators, and High Aspect Ratio Microsystems Technology (HARMST).
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