Molecular Modelling: Principles and Applications, Andrew Leach
Старое издание
Название: Molecular Modeling Principles & Applications ISBN: 0582239338 ISBN-13(EAN): 9780582239333 Издательство: Pearson Education Цена: 5016.00 р. Наличие на складе: Невозможна поставка.
Автор: H?ltje Название: Molecular Modeling - Basic Principles and Applications 3e ISBN: 3527315683 ISBN-13(EAN): 9783527315680 Издательство: Wiley Рейтинг: Цена: 11563.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Umfassend und pr zise, besonders f 1/4r Anf nger gut verst ndlich: Dieser Band erkl rt die Grundlagen der Molek 1/4lmodellierung kompetent und nachvollziehbar. Ausf 1/4hrlichen Informationen zur Modellierung von kleinen Molek 1/4len und Proteinen folgen durchgearbeitete Beispiele, die dem Leser den Weg zum ersten eigenen Experiment ebnen. Neu in dieser dritten Auflage ist ein Kapitel zur Chemogenomik, das (gemeinsam mit dem 1/4berarbeiteten und erweiterten Beispiel zur Behandlung komplizierterer Biomolek 1/4le) den gegenw rtigen Trend zur chemischen Biologie widerspiegelt. Die Autoren, erfahrene Dozenten in diesem Themenbereich, garantieren die Praxistauglichkeit des Bandes als Begleiter einschl giger Vorlesungen. F 1/4r Fachleute interessant: Als einziges gegenw rtig erh ltliches Werk enth lt das Buch einen systematischen Vergleich der M glichkeiten und Grenzen moderner MM-Verfahren und entsprechender Software-Pakete.
Автор: Barnat Edward V., Lu Toh-Ming Название: Pulsed and Pulsed Bias Sputtering / Principles and Applications ISBN: 140207543X ISBN-13(EAN): 9781402075438 Издательство: Springer Рейтинг: Цена: 19564.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Pulsed and pulsed bias sputter deposition are advanced thin deposition techniques that allow one to produce high quality metal and insulating films. In the pulsed sputtering case, the technique allows one to deposit insulating films while minimizing adverse effects associated with charge accumulation on the target in the reactive deposition mode. In the pulsed bias sputtering case, one can deposit metal films on an insulating substrate while controlling the degree of charging on the substrate. One of the important aspects of these techniques is to be able to control the film properties such as density, orientation, texture, and morphology during deposition. This book provides basic knowledge on the design of the instrumentation for pulsed and pulsed bias sputtering techniques as well as the knowledge for the control of thin film properties using the deposition parameters such as pulsing cycle and duty.The book focuses on the basic principles and experimentation of the pulsed and pulsed bias sputter deposition of thin films. The transient charging characteristics of the target in the DC reactive sputtering of insulator films and of the insulating substrate in the DC sputtering of metal films without the pulsing are discussed in detail. The predictions and experimentation of the discharging (neutralization) strategies using pulsing potentials are presented. Examples are given on the growth of thin films using these strategies and on the relationship between the film properties the pulsing parameters. In addition, the book also presents in a coherent manner the basic physics of DC plasma formation and the utilization of the plasma in the sputtering environment. The book will not only be useful for academic researchers but also for industrial scientists interested in sputter coating of high quality metal and insulating films.
Автор: V.P. Gupta Название: Principles And Applications Of Quantum Chemistry ISBN: 0128034785 ISBN-13(EAN): 9780128034781 Издательство: Elsevier Science Рейтинг: Цена: 12462.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Principles and Applications of Quantum Chemistry offers clear and simple coverage based on the author’s extensive teaching at advanced universities around the globe. Where needed, derivations are detailed in an easy-to-follow manner so that you will understand the physical and mathematical aspects of quantum chemistry and molecular electronic structure. Building on this foundation, this book then explores applications, using illustrative examples to demonstrate the use of quantum chemical tools in research problems. Each chapter also uses innovative problems and bibliographic references to guide you, and throughout the book chapters cover important advances in the field including: Density functional theory (DFT) and time-dependent DFT (TD-DFT), characterization of chemical reactions, prediction of molecular geometry, molecular electrostatic potential, and quantum theory of atoms in molecules.
Описание: This substantially revised and expanded new edition of the bestselling textbook, addresses the difficulties that can arise with the mathematics that underpins the study of symmetry, and acknowledges that group theory can be a complex concept for students to grasp.
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