Handbook of Sputter Deposition Technology,, Kiyotaka Wasa
Старое издание
Автор: Kiyotaka Wasa Название: Handbook of Sputter Deposition Technology, ISBN: 0815512805 ISBN-13(EAN): 9780815512806 Издательство: Elsevier Science Цена: 12359 р. Наличие на складе: Невозможна поставка. Описание: Cathode sputtering is used in the microelectronics industry for silicon integrated circuit production and for metallurgical coatings. High temperature superconductors can be synthesized with sputtering under non-equilibrium conditions. This book presents an overview of sputter deposition technology, a key technology for materials research.
Описание: This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Автор: Dobkin D.M., Zuraw M.K. Название: Principles of Chemical Vapor Deposition ISBN: 1402012489 ISBN-13(EAN): 9781402012488 Издательство: Springer Рейтинг: Цена: 18349 р. Наличие на складе: Поставка под заказ.
Описание: Do you work with chemical Vapor deposition processes or reactors? Have you ever wondered what goes on inside the chamber or how the deposition processes work? If the answer to this is yes, then Principles of Chemical Vapor Deposition is for you! Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.This book will be invaluable to process engineers, graduate students and researchers newly involved in the development of processes and hardware for chemical vapor deposition. In addition, the book is appropriate for senior level undergraduates or graduate courses on chemical vapor deposition as well as semiconductor manufacturing and coating technologies.
Автор: Depla Название: Reactive Sputter Deposition ISBN: 3540766626 ISBN-13(EAN): 9783540766629 Издательство: Springer Рейтинг: Цена: 26564 р. Наличие на складе: Поставка под заказ.
Описание: In the family of Physical Vapour Deposition techniques, sputtering is one of the most important. This book describes various aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth allowing the reader to understand the complete process.
Автор: Donald M. Mattox Название: Handbook of Physical Vapor Deposition ISBN: 0815514220 ISBN-13(EAN): 9780815514220 Издательство: Elsevier Science Рейтинг: Цена: 24255 р. Наличие на складе: Невозможна поставка.
Описание: Covers various aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. This book also covers substrate characterization, adhesion, cleaning and processing.
Описание: This is the first book to describe a family of plasma techniques used to modify the surface and near-surface layer of solid materials.
Автор: Krishna Seshan Название: Handbook of Thin Film Deposition, ISBN: 1437778739 ISBN-13(EAN): 9781437778731 Издательство: Elsevier Science Рейтинг: Цена: 17903 р. Наличие на складе: Поставка под заказ.
Описание: The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films.
Автор: Krishna Seshan Название: Handbook of Thin Film Deposition, ISBN: 0815514425 ISBN-13(EAN): 9780815514428 Издательство: Elsevier Science Рейтинг: Цена: 17903 р. Наличие на складе: Невозможна поставка.
Описание: A book on deposition for engineers, technicians, and plant personnel in the semiconductor industry. It traces the technology behind the growth in the silicon semiconductor industry and the trend in miniaturization. It explains the growth of automatic tools capable of measuring thickness and spacing of sub-micron dimensions.
Автор: Hugh O. Pierson Название: Handbook of Chemical Vapor Deposition, 2nd Edition, ISBN: 0815514328 ISBN-13(EAN): 9780815514329 Издательство: Elsevier Science Рейтинг: Цена: 21945 р. Наличие на складе: Поставка под заказ.
Описание: Offers an understanding of the advances in the Chemical Vapor Deposition (CVD) process. This book features data on both Plasma CVD and metallo-organic CVD processes. It also explains growing importance of CVD in production of semiconductor and related applications.
Автор: M. Elimelech Название: Particle Deposition & Aggregation, ISBN: 075067024X ISBN-13(EAN): 9780750670241 Издательство: Elsevier Science Рейтинг: Цена: 13629 р. Наличие на складе: Поставка под заказ.
Описание: Deposition and aggregation of small solid particles are encountered in many natural and industrial environments. Whether it be deposition of particles onto a surface immersed in a liquid suspension or aggregateion of individual particles, these processes are of enotmous significance. They are vital to the manufacture of magnetic tape, purification of water using packed bed filters, selective capture of solids, cells and macromolecular species, and many other applications.
This book presents a unified approach to the measurement, modelling and simulation of these processes, bringing together the disciplines of colliod and surface chemistry, hydrodynamics, and experimental and computational methods. It will be required reading for graduates working in process and environmental engineering, postgraduates involved in industrial R & D and for all scientists wishing to gain a more detailed and realistic understanding of process conditions in these areas.
Автор: Sreeharsha Название: Principles Of Vapour Deposition Of Thin Films ISBN: 008044699X ISBN-13(EAN): 9780080446998 Издательство: Elsevier Science Рейтинг: Цена: 21945 р. Наличие на складе: Поставка под заказ.
Описание: The goal of producing devices that are smaller, faster, and more functional has given thin film processing a unique role in technology. This work aims to provide the foundation upon which thin film science and technological innovation are possible. It offers derivation of important formulae, and covers the basic principles of materials science.
Описание: Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.
Автор: John E. Mahan Название: Physical Vapor Deposition of Thin Films ISBN: 0471330019 ISBN-13(EAN): 9780471330011 Издательство: Wiley Рейтинг: Цена: 21313 р. Наличие на складе: Поставка под заказ.
Описание: A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and engineers in thfield with the information they need to tackle thin film processes in the real world. Presenting a cohesive, thoroughly developed treatment of both fundamental and applied topics, Physical Vapor Deposition of Thin Films incorporates many critical results from across the literature as it imparts a working knowledge of a variety of present-day techniques. Numerous worked examples, extensive references, and more than 100 illustrations and photographs accompany coverage of: * Thermal evaporation, sputtering, and pulsed laser deposition techniques * Key theories and phenomena, including the kinetic theory of gases, adsorption and condensation, high-vacuum pumping dynamics, and sputtering discharges * Trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets * Quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam
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