Understanding and Applying Machine Vision, Second Edition, Revised and Expanded, Zeuch

Автор: O`Malley John, O`Malley John
Название: Schaum`s Outline of Basic Circuit Analysis, Revised Second Edition
ISBN: 0071756434 ISBN-13(EAN): 9780071756433
Издательство: McGraw-Hill
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Цена: 3087.00 р.
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Описание:

The ideal review for your basic circuit analysis course More than 40 million students have trusted Schaum's Outlines for their expert knowledge and helpful solved problems. Written by renowned experts in their respective fields, Schaum's Outlines cover everything from math to science, nursing to language. The main feature for all these books is the solved problems. Step-by-step, authors walk readers through coming up with solutions to exercises in their topic of choice. 700 solved problems Outline format supplies a concise guide to the standard college course in basic circuits Clear, concise explanations of all electric circuits concepts Appropriate for the following courses: Basic Circuit Analysis, Electrical Circuits, Electrical Engineering Circuit Analysis, Introduction to Circuit Analysis, AC & DC Circuits Supports and supplements the bestselling textbooks in circuits Easily understood review of basic circuit analysis Supports all the major textbooks for basic circuit analysis courses

Автор: Gutierrez JosГ© A., Armstrong Brian S.R.
Название: Precision Landmark Location for Machine Vision and Photogrammetry / Finding and Achieving the Maximum Possible Accuracy
ISBN: 1846289122 ISBN-13(EAN): 9781846289125
Издательство: Springer
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Цена: 15372.00 р.
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Описание: The applications of image-based measurement are many and various: image-guided surgery, mobile-robot navigation, component alignment, part inspection and photogrammetry, among others. In all these applications, landmarks are detected and located in images, and measurements made from those locations.Precision Landmark Location for Machine Vision and Photogrammetry addresses the ubiquitous problem of measurement error associated with determining the location of landmarks in images. With a detailed model of the image formation process and landmark location estimation, the CramГ©r–Rao Lower Bound (CRLB) theory of statistics is applied to determine the least possible measurement uncertainty in a given situation.This monograph provides the reader with:• the most complete treatment to date of precision landmark location and the engineering aspects of image capture and processing;• detailed theoretical treatment of the CRLB;• a software tool for analyzing the potential performance-specific camera/lens/algorithm configurations;• two novel algorithms which achieve precision very close to the CRLB;• an experimental method for determining the accuracy of landmark location;• downloadable MATLABВ® package to assist the reader with applying theoretically-derived results to practical engineering configurations.All of this adds up to a treatment that is at once theoretically sound and eminently practical.Precision Landmark Location for Machine Vision and Photogrammetry will be of great interest to computer scientists and engineers working with and/or studying image processing and measurement. It includes cutting-edge theoretical developments and practical tools so it will appeal to research investigators and system designers.