Strong and Superstrong Pulsed Magnetic Fields Generation, German A. Shneerson, Mikhail I. Dolotenko, Sergey

Автор: Barnat Edward V., Lu Toh-Ming
Название: Pulsed and Pulsed Bias Sputtering / Principles and Applications
ISBN: 140207543X ISBN-13(EAN): 9781402075438
Издательство: Springer
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Описание: Pulsed and pulsed bias sputter deposition are advanced thin deposition techniques that allow one to produce high quality metal and insulating films. In the pulsed sputtering case, the technique allows one to deposit insulating films while minimizing adverse effects associated with charge accumulation on the target in the reactive deposition mode. In the pulsed bias sputtering case, one can deposit metal films on an insulating substrate while controlling the degree of charging on the substrate. One of the important aspects of these techniques is to be able to control the film properties such as density, orientation, texture, and morphology during deposition. This book provides basic knowledge on the design of the instrumentation for pulsed and pulsed bias sputtering techniques as well as the knowledge for the control of thin film properties using the deposition parameters such as pulsing cycle and duty.The book focuses on the basic principles and experimentation of the pulsed and pulsed bias sputter deposition of thin films. The transient charging characteristics of the target in the DC reactive sputtering of insulator films and of the insulating substrate in the DC sputtering of metal films without the pulsing are discussed in detail. The predictions and experimentation of the discharging (neutralization) strategies using pulsing potentials are presented. Examples are given on the growth of thin films using these strategies and on the relationship between the film properties the pulsing parameters. In addition, the book also presents in a coherent manner the basic physics of DC plasma formation and the utilization of the plasma in the sputtering environment. The book will not only be useful for academic researchers but also for industrial scientists interested in sputter coating of high quality metal and insulating films.

Автор: Breuillard
Название: Thin Groups and Superstrong Approximation
ISBN: 1107036852 ISBN-13(EAN): 9781107036857
Издательство: Cambridge Academ
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Цена: 21226.00 р.
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Описание: This collection of survey and research articles focuses on recent developments in quantitative aspects of `thin groups`. It provides a broad panorama of a very active field at the boundary between geometry, dynamical systems, number theory and combinatorics for professional mathematicians and graduate students in this fascinating area of research.

Автор: Altgilbers Larry L Et Al
Название: Explosive Pulsed Power
ISBN: 1848163223 ISBN-13(EAN): 9781848163225
Издательство: World Scientific Publishing
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Цена: 30096.00 р.
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Описание: Explosive pulsed power generators are devices that either convert the chemical energy stored in explosives into electrical energy or use the shock waves generated by explosives to release energy stored in ferroelectric and ferromagnetic materials. This book intends to acquaint the reader with the principles of operation of explosive generators.

Автор: Eason R
Название: Pulsed Laser Deposition of Thin Fil
ISBN: 0471447099 ISBN-13(EAN): 9780471447092
Издательство: Wiley
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Цена: 34048.00 р.
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Описание: Pulsed Laser Deposition (PLD) has emerged as one of the most popular techniques for depositing some of the most exciting materials being explored for next generation applications. PLD is no longer viewed as an experimental curiosity, but instead it has grown to be a research and development tool in the most wide-ranging of fields.

Автор: Lehr
Название: Foundations of Pulsed Power Technology
ISBN: 111862839X ISBN-13(EAN): 9781118628393
Издательство: Wiley
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Описание: This book deals with multigigawatt, ultrashort pulse power system design, beginning with the design of individual components such as impulse generators/pulse forming lines/closing & opening switches/capacitor banks.