Semiconductor Lithography, Wayne M. Moreau

Автор: Mack
Название: Fundamental Principles of Optical Lithography: The Science of Microfabrication
ISBN: 0470727306 ISBN-13(EAN): 9780470727300
Издательство: Wiley
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Цена: 9179.00 р.
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Описание: Fundamental Principles of Optical Lithography: The Science of Microfabrication presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. This sole-authored text includes optional computer simulation exercises as well as problems at the end of each chapter.

Автор: Wai Kin Chim
Название: Semiconductor Device and Failure Analysis : Using Photon Emission Microscopy
ISBN: 047149240X ISBN-13(EAN): 9780471492405
Издательство: Wiley
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Цена: 30722.00 р.
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Описание: Fault detection has become increasingly difficult as integrated circuits become more and more complex. Photon Emission Microscopy (PEM) is a physical failure analysis technique which locates and identifies faults in integrated circuits.

Автор: Xia
Название: Semiconductor Spintronics
ISBN: 9814327905 ISBN-13(EAN): 9789814327909
Издательство: World Scientific Publishing
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Цена: 27720.00 р.
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Описание: Semiconductor Spintronics, as an emerging research discipline and an important advanced field in physics, has developed quickly and obtained fruitful results. This monograph summarizes the physical foundation and the experimental results obtained in this field.

Автор: Weimin Zhou
Название: Nanoimprint Lithography: An Enabling Process for Nanofabrication
ISBN: 3642344275 ISBN-13(EAN): 9783642344275
Издательство: Springer
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Цена: 19591.00 р.
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Описание: With hundreds of explanatory figures and tables, this volume deals with the latest achievements in hot areas such as nanofabrication and nanotechnology, with multi-disciplinary results on promising low-cost, high-throughput nanostructure manufacturing methods.

Автор: Bei Yu; David Z. Pan
Название: Design for Manufacturability with Advanced Lithography
ISBN: 3319203843 ISBN-13(EAN): 9783319203843
Издательство: Springer
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Цена: 11179.00 р.
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Описание: This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).