Ion Implantation: Basics to Device Fabrication, Emanuele Rimini

Автор: Stanley R. Glasser; David W. Bullock
Название: Cellular and Molecular Aspects of Implantation
ISBN: 146133182X ISBN-13(EAN): 9781461331827
Издательство: Springer
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Описание: In pregnancy, the uterus acquires this impor- tance with the arrival of the fertilized egg, which takes up residence for periods ranging from about 2 weeks in the opossum to about 2 years in the elephant.

Автор: Fernando A. Lasagni; Andr?s F. Lasagni
Название: Fabrication and Characterization in the Micro-Nano Range
ISBN: 3642267548 ISBN-13(EAN): 9783642267543
Издательство: Springer
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Описание: This update in the field presents micro/nano fabrications techniques of two and three dimensional structures. Several examples are presented, which illustrate the direct application in different technological fields such as microfluidics, photonics, and biotechnology.

Автор: Klaus Graff
Название: Metal Impurities in Silicon-Device Fabrication
ISBN: 3642629652 ISBN-13(EAN): 9783642629655
Издательство: Springer
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Описание: This up-to-date monograph provides a thorough review of the relevant data and properties of the transition-metal impurities generated during silicon-sample and device fabrication. This new edition includes important recent data and many new tables.

Автор: Alexandru Grumezescu
Название: Fabrication and Self Assembly of Nanobiomaterials
ISBN: 0323415334 ISBN-13(EAN): 9780323415330
Издательство: Elsevier Science
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Описание:

"Fabrication and Self-Assembly of Nanobiomaterials" presents the most recent findings regarding the fabrication and self-assembly of nanomaterials for different biomedical applications. Respected authors from around the world offer a comprehensive look at how nanobiomaterials are made, enabling knowledge from current research to be used in an applied setting.

Recent applications of nanotechnology in the biomedical field have developed in response to an increased demand for innovative approaches to diagnosis, exploratory procedures and therapy. The book provides the reader with a strong grounding in emerging biomedical nanofabrication technologies, covering numerous fabrication routes for specific applications are described in detail and discussing synthesis, characterization and current or potential future use.

This book will be of interest to professors, postdoctoral researchers and students engaged in the fields of materials science, biotechnology and applied chemistry. It will also be highly valuable to those working in industry, including pharmaceutics and biotechnology companies, medical researchers, biomedical engineers and advanced clinicians.
An up-to-date and highly structured reference source for practitioners, researchers and students working in biomedical, biotechnological and engineering fields.A valuable guide to recent scientific progress, covering major and emerging applications of nanomaterials in the biomedical field.Proposes novel opportunities and ideas for developing or improving technologies in fabrication and self-assembly.

Автор: H. Ryssel; H. Glawischnig
Название: Ion Implantation Techniques
ISBN: 3642687814 ISBN-13(EAN): 9783642687815
Издательство: Springer
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Описание: In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech- niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech- niques, held at Queen's University, ' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan- tation conference for the first time. This implantation school concentra- ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con- trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap- ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec- tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given.