Periodic materials and interference lithography for photonics, phononics and mechanics, Maldovan

Автор: Henry Radamson
Название: Monolithic Nanoscale Photonics-Electronics Integration in Silicon
ISBN: 0124199755 ISBN-13(EAN): 9780124199750
Издательство: Elsevier Science
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Цена: 7409.00 р.
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Описание: Silicon technology is evolving rapidly, particularly in board-to-board or chip-to chip applications. This book describes the merging of photonics and electronics in silicon and other group IV elements. It presents the challenges, the limitations, and the upcoming possibilities of these developments.

Автор: Robinson, Alex
Название: Materials and Processes for Next Generation Lithography,11
ISBN: 0081003544 ISBN-13(EAN): 9780081003541
Издательство: Elsevier Science
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Цена: 22738.00 р.
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Описание: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. . These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. . This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication.