Chemical Vapour Deposition, Xiu-Tian Yan; Yongdong Xu

Автор: Xiu-Tian Yan; Yongdong Xu
Название: Chemical Vapour Deposition
ISBN: 1447125509 ISBN-13(EAN): 9781447125501
Издательство: Springer
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Цена: 26120.00 р.
Наличие на складе: Есть у поставщика Поставка под заказ.

Описание: Chemical Vapour Deposition explores the design capabilities and applications of advanced materials. From physical fundamentals to the optimization of processing parameters, this volume presents the development and manufacture of high performance materials.

Автор: Kiyotaka Wasa
Название: Handbook of Sputter Deposition Technology,
ISBN: 1437734839 ISBN-13(EAN): 9781437734836
Издательство: Elsevier Science
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Цена: 21054.00 р.
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Описание: Faetures a team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. This book introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.

Автор: Minier
Название: Particles in Wall-Bounded Turbulent Flows: Deposition, Re-Suspension and Agglomeration
ISBN: 3319415662 ISBN-13(EAN): 9783319415666
Издательство: Springer
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Цена: 20962.00 р.
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Описание: The book presents an up-to-date review of turbulent two-phase flows with the dispersed phase, with an emphasis on the dynamics in the near-wall region. Also included are models of particle dynamics in wall-bounded turbulent flows, and a description of particle surface interactions including muti-layer deposition and re-suspension.