Fortifying China: The Struggle to Build a Modern Defense Economy, Cheung Tai Ming
Автор: Cheung, Kin P. Название: Plasma charging damage ISBN: 1447110625 ISBN-13(EAN): 9781447110620 Издательство: Springer Рейтинг: Цена: 20962.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: In the 50 years since the invention of transistor, silicon integrated circuit (IC) technology has made astonishing advances. In state of the art silicon Ie manufacturing process, plasma is used in more than 20 different critical steps.
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