Handbook of Physical Vapor Deposition (PVD) Processing,, Donald M. Mattox

Автор: Donald M. Mattox
Название: Handbook of Physical Vapor Deposition
ISBN: 0815514220 ISBN-13(EAN): 9780815514220
Издательство: Elsevier Science
Цена: 30949.00 р.
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Описание: Covers various aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. This book also covers substrate characterization, adhesion, cleaning and processing.

Автор: Depla
Название: Reactive Sputter Deposition
ISBN: 3540766626 ISBN-13(EAN): 9783540766629
Издательство: Springer
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Цена: 32142.00 р.
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Описание: In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process.

Автор: Kiyotaka Wasa
Название: Handbook of Sputter Deposition Technology,
ISBN: 1437734839 ISBN-13(EAN): 9781437734836
Издательство: Elsevier Science
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Цена: 21054.00 р.
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Описание: Faetures a team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. This book introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.