Laser Processing: Surface Treatment and Film Deposition, J. Mazumder; O. Conde; R. Vilar; W. Steen

Автор: Cordoba Castillo, Rosa
Название: Functional nanostructures fabricated by focused electron/ion beam induced deposition
ISBN: 3319020803 ISBN-13(EAN): 9783319020808
Издательство: Springer
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Цена: 15672.00 р.
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Описание: This book offers a detailed study of functional nanostructures (ferromagnetic, superconducting, metallic and semiconducting) fabricated by focused electron/ion beam induced deposition techniques.

Автор: Minier
Название: Particles in Wall-Bounded Turbulent Flows: Deposition, Re-Suspension and Agglomeration
ISBN: 3319415662 ISBN-13(EAN): 9783319415666
Издательство: Springer
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Цена: 20962.00 р.
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Описание: The book presents an up-to-date review of turbulent two-phase flows with the dispersed phase, with an emphasis on the dynamics in the near-wall region. Also included are models of particle dynamics in wall-bounded turbulent flows, and a description of particle surface interactions including muti-layer deposition and re-suspension.

Автор: Kiyotaka Wasa
Название: Handbook of Sputter Deposition Technology,
ISBN: 1437734839 ISBN-13(EAN): 9781437734836
Издательство: Elsevier Science
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Цена: 21054.00 р.
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Описание: Faetures a team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. This book introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.

Автор: Xiu-Tian Yan; Yongdong Xu
Название: Chemical Vapour Deposition
ISBN: 1447125509 ISBN-13(EAN): 9781447125501
Издательство: Springer
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Цена: 26120.00 р.
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Описание: Chemical Vapour Deposition explores the design capabilities and applications of advanced materials. From physical fundamentals to the optimization of processing parameters, this volume presents the development and manufacture of high performance materials.

Автор: Oscar Alejandro Oviedo; Luis Reinaudi; Silvana Gar
Название: Underpotential Deposition
ISBN: 3319243926 ISBN-13(EAN): 9783319243924
Издательство: Springer
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Цена: 18284.00 р.
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Описание: They also discuss real surface determinations and layer-by-layer growth of ultrathin films, as well as the very latest modeling approaches to UPD based on nanothermodynamics, statistical mechanics, molecular dynamics and Monte-Carlo simulations.

Автор: Xiu-Tian Yan; Yongdong Xu
Название: Chemical Vapour Deposition
ISBN: 1848828934 ISBN-13(EAN): 9781848828933
Издательство: Springer
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Цена: 26122.00 р.
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Описание: Chemical Vapour Deposition explores the design capabilities and applications of advanced materials. From physical fundamentals to the optimization of processing parameters, this volume presents the development and manufacture of high performance materials.

Автор: Bekir Sami Yilbas; Shahzada Zaman Shuja
Название: Laser Surface Processing and Model Studies
ISBN: 3642366287 ISBN-13(EAN): 9783642366284
Издательство: Springer
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Цена: 18284.00 р.
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Описание: This book introduces model studies associated with laser surface processing such as conduction limited heating, surface re-melting, Marangoni flow and its effects on the temperature field, re-melting of multi-layered surfaces, and laser shock processing.

Автор: Roman Louban
Название: Image Processing of Edge and Surface Defects
ISBN: 3642260357 ISBN-13(EAN): 9783642260353
Издательство: Springer
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Цена: 15672.00 р.
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Описание: The edge and surface inspection is one of the most important and most challenging tasks in quality assessment in industrial production. Providing a valuable reference, this book offers a detailed description of optical methods for defect recognition.

Автор: Zhang Yongkang
Название: Laser Shock Processing of FCC Metals
ISBN: 3642356737 ISBN-13(EAN): 9783642356735
Издательство: Springer
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Цена: 18284.00 р.
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Описание: This book covers a promising new surface treatment technique for improving fatigue durability, corrosion, wear resistance and other mechanical properties of metals and alloys. Examines the underlying mechanism for grain refinement by ultra-high strain rate.