Автор: R. Behrisch Название: Sputtering by Particle Bombardment II ISBN: 3662311690 ISBN-13(EAN): 9783662311691 Издательство: Springer Рейтинг: Цена: 13060.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Автор: Rainer Behrisch; Wolfgang Eckstein Название: Sputtering by Particle Bombardment ISBN: 364207944X ISBN-13(EAN): 9783642079443 Издательство: Springer Рейтинг: Цена: 33541.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Especially welcome is a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields, which is useful for researchers who need sputtering yields for physics research or applied problems.
Автор: R. Behrisch; Rainer Behrisch; Klaus Wittmaack; W. Название: Sputtering by Particle Bombardment III ISBN: 3662311046 ISBN-13(EAN): 9783662311042 Издательство: Springer Рейтинг: Цена: 11179.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering.
Автор: Barnat Edward V., Lu Toh-Ming Название: Pulsed and Pulsed Bias Sputtering / Principles and Applications ISBN: 140207543X ISBN-13(EAN): 9781402075438 Издательство: Springer Рейтинг: Цена: 19564.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Pulsed and pulsed bias sputter deposition are advanced thin deposition techniques that allow one to produce high quality metal and insulating films. In the pulsed sputtering case, the technique allows one to deposit insulating films while minimizing adverse effects associated with charge accumulation on the target in the reactive deposition mode. In the pulsed bias sputtering case, one can deposit metal films on an insulating substrate while controlling the degree of charging on the substrate. One of the important aspects of these techniques is to be able to control the film properties such as density, orientation, texture, and morphology during deposition. This book provides basic knowledge on the design of the instrumentation for pulsed and pulsed bias sputtering techniques as well as the knowledge for the control of thin film properties using the deposition parameters such as pulsing cycle and duty.The book focuses on the basic principles and experimentation of the pulsed and pulsed bias sputter deposition of thin films. The transient charging characteristics of the target in the DC reactive sputtering of insulator films and of the insulating substrate in the DC sputtering of metal films without the pulsing are discussed in detail. The predictions and experimentation of the discharging (neutralization) strategies using pulsing potentials are presented. Examples are given on the growth of thin films using these strategies and on the relationship between the film properties the pulsing parameters. In addition, the book also presents in a coherent manner the basic physics of DC plasma formation and the utilization of the plasma in the sputtering environment. The book will not only be useful for academic researchers but also for industrial scientists interested in sputter coating of high quality metal and insulating films.
Автор: Edward V. Barnat; Toh-Ming Lu Название: Pulsed and Pulsed Bias Sputtering ISBN: 1461350638 ISBN-13(EAN): 9781461350637 Издательство: Springer Рейтинг: Цена: 18167.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: This thesis describes the fabrication of metal-insulator-semiconductor (MIS) structures using very high permittivity dielectrics (based on rare earths) grown by high-pressure sputtering from metallic targets.
Автор: Depla Название: Reactive Sputter Deposition ISBN: 3540766626 ISBN-13(EAN): 9783540766629 Издательство: Springer Рейтинг: Цена: 32142.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process.
Автор: Ana Paula Pinto Correia; Pedro Miguel C?ndido Barq Название: A Second-Order ?? ADC Using Sputtered IGZO TFTs ISBN: 3319271903 ISBN-13(EAN): 9783319271903 Издательство: Springer Рейтинг: Цена: 9141.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: This books discusses the design, electrical simulation and layout of a 2nd-order ГЇВїВЅ ГЇВїВЅ analog-to-digital converter (ADC), using oxide thin-film transistors (TFTs) technology.
Автор: Kiyotaka Wasa Название: Handbook of Sputter Deposition Technology, ISBN: 1437734839 ISBN-13(EAN): 9781437734836 Издательство: Elsevier Science Рейтинг: Цена: 21054.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Faetures a team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. This book introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.
Автор: Anouar Hajjaji; Mosbah Amlouk; Mounir Gaidi; Brahi Название: Chromium Doped TiO2 Sputtered Thin Films ISBN: 3319133527 ISBN-13(EAN): 9783319133522 Издательство: Springer Рейтинг: Цена: 7836.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: This book presents co-sputtered processes ways to produce chrome doped TiO2 thin films onto various substrates such as quartz, silicon and porous silicon. The book explores the potencial applications of devices based on Cr doped TiO2 thin films as gas sensors and in photocatalysis and in the photovoltaic industry.
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