Scanning Electron Microscopy of Vascular Casts: Methods and Applications, P. Motta; Takuro Murakami; H. Fujita

Автор: S.H. Aharinejad; A. Lametschwandtner
Название: Microvascular Corrosion Casting in Scanning Electron Microscopy
ISBN: 3709192323 ISBN-13(EAN): 9783709192320
Издательство: Springer
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Описание: Several methods have been used to demonstrate the vasculature of different organs in man and other species. The development of electron microscope in thirties opend new perspectives in researching microvascular systems. Its application to medical and biological problems justify it to be used as a routine method for microvascular investigations.

Автор: Kenichi Shimizu; Tomoaki Mitani
Название: New Horizons of Applied Scanning Electron Microscopy
ISBN: 364226168X ISBN-13(EAN): 9783642261688
Издательство: Springer
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Описание: In modern scanning electron microscopy, sample surface preparation is of key importance. This book presents the procedures for sample surface preparation, thereby facilitating unprecedented capabilities with advanced scanning electron microscopes.

Автор: Joseph Goldstein; Dale Newbury; David Joy; Joseph
Название: Scanning Electron Microscopy and X-Ray Microanalysis
ISBN: 149396674X ISBN-13(EAN): 9781493966745
Издательство: Springer
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Описание: This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc.

In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD).

With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling.

New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process.

This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation. Includes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to "read it all" to understand a topicIncludes an online supplement-an extensive "Database of Electron-Solid Interactions"-which can be accessed on SpringerLink, in Chapter 3

Автор: Joseph Goldstein
Название: Practical Scanning Electron Microscopy
ISBN: 1461344247 ISBN-13(EAN): 9781461344247
Издательство: Springer
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Описание: In the spring of 1963, a well-known research institute made a market survey to assess how many scanning electron microscopes might be sold in the United States. This range overlaps considerably with the light microscope at the low end, and with the electron microscope at the high end.

Автор: Patrick Echlin; C.E. Fiori; Joseph Goldstein; Davi
Название: Advanced Scanning Electron Microscopy and X-Ray Microanalysis
ISBN: 1475790295 ISBN-13(EAN): 9781475790290
Издательство: Springer
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Описание: This book has its origins in the intensive short courses on scanning elec- tron microscopy and x-ray microanalysis which have been taught annually at Lehigh University since 1972.

Автор: Zhong Lin Wang, Weilie Zhou
Название: Scanning microscopy for nanotechnology
ISBN: 0387333258 ISBN-13(EAN): 9780387333250
Издательство: Springer
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Цена: 26122.00 р.
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Описание: Scanning electron microscopy (SEM) can be exploited not only for nanomaterials characterization but also integrated with new technologies for in-situ nanomaterials engineering and manipulation. Scanning Microscopy for Nanotechnology addresses the rapid development of these techniques for nanotechnology, in both technique and application chapters by leading practitioners. The book covers topics including nanomaterials imaging, X-ray microanalysis, high-resolution SEM, low kV SEM, cryo-SEM, as well as new techniques such as electron back scatter diffraction (EBSD) and scanning transmission electron microscopy (STEM). Fabrication techniques integrated with SEM, such as e-beam nanolithography, nanomanipulation, and focused ion beam nanofabrication, are major new dimensions for SEM application. Application areas include the study of nanoparticles, nanowires and nanotubes, three-dimensional nanostructures, quantum dots, magnetic nanomaterials, photonic structures, and bio-inspired nanomaterials. This book will appeal not only to a broad spectrum of nanomaterials researchers, but also to SEM development specialists.

Автор: Joseph Goldstein; Dale E. Newbury; Patrick Echlin;
Название: Scanning Electron Microscopy and X-Ray Microanalysis
ISBN: 1461332753 ISBN-13(EAN): 9781461332756
Издательство: Springer
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Автор: Joseph Goldstein; Dale E. Newbury; David C. Joy; C
Название: Scanning Electron Microscopy and X-ray Microanalysis
ISBN: 1461349699 ISBN-13(EAN): 9781461349693
Издательство: Springer
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Описание: An ideal text for students as well as practitioners, this is a comprehensive introduction to the field of scanning electron microscopy (SEM) and X-ray microanalysis. The authors emphasize the practical aspects of the techniques described.

Автор: Nicolas Brodusch; Hendrix Demers; Raynald Gauvin
Название: Field Emission Scanning Electron Microscopy
ISBN: 9811044325 ISBN-13(EAN): 9789811044328
Издательство: Springer
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Описание: This book highlights what is now achievable in terms of materials characterization with the new generation of cold-field emission scanning electron microscopes applied to real materials at high spatial resolution.

Автор: David G. Rickerby; Giovanni Valdr?; Ugo Valdr?
Название: Impact of Electron and Scanning Probe Microscopy on Materials Research
ISBN: 0792359402 ISBN-13(EAN): 9780792359401
Издательство: Springer
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Цена: 18167.00 р.
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Описание: Covers diffraction contrast and defect analysis by conventional TEM lattice imaging, phase contrast and resolution limits in high resolution electron microscopy. This book covers specialized electron diffraction techniques, and the application of parallel electron energy loss spectroscopy and scanning transmission EM for subnanometer analysis.