High power impulse magnetron sputtering :, Daniel Lundin, Jon Tomas Gudmundsson
Автор: Rainer Behrisch; Wolfgang Eckstein Название: Sputtering by Particle Bombardment ISBN: 364207944X ISBN-13(EAN): 9783642079443 Издательство: Springer Рейтинг: Цена: 33541.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Especially welcome is a new summary of the measured and calculated sputtering yields with an algebraic approximation formula for the energy and angular dependence of the yields, which is useful for researchers who need sputtering yields for physics research or applied problems.
Автор: Barnat Edward V., Lu Toh-Ming Название: Pulsed and Pulsed Bias Sputtering / Principles and Applications ISBN: 140207543X ISBN-13(EAN): 9781402075438 Издательство: Springer Рейтинг: Цена: 19564.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Pulsed and pulsed bias sputter deposition are advanced thin deposition techniques that allow one to produce high quality metal and insulating films. In the pulsed sputtering case, the technique allows one to deposit insulating films while minimizing adverse effects associated with charge accumulation on the target in the reactive deposition mode. In the pulsed bias sputtering case, one can deposit metal films on an insulating substrate while controlling the degree of charging on the substrate. One of the important aspects of these techniques is to be able to control the film properties such as density, orientation, texture, and morphology during deposition. This book provides basic knowledge on the design of the instrumentation for pulsed and pulsed bias sputtering techniques as well as the knowledge for the control of thin film properties using the deposition parameters such as pulsing cycle and duty.The book focuses on the basic principles and experimentation of the pulsed and pulsed bias sputter deposition of thin films. The transient charging characteristics of the target in the DC reactive sputtering of insulator films and of the insulating substrate in the DC sputtering of metal films without the pulsing are discussed in detail. The predictions and experimentation of the discharging (neutralization) strategies using pulsing potentials are presented. Examples are given on the growth of thin films using these strategies and on the relationship between the film properties the pulsing parameters. In addition, the book also presents in a coherent manner the basic physics of DC plasma formation and the utilization of the plasma in the sputtering environment. The book will not only be useful for academic researchers but also for industrial scientists interested in sputter coating of high quality metal and insulating films.
Описание: This thesis provides an overview of fundamental issues specific to photovoltaic systems, starting with building of the photovoltaic cell, description of dedicated measurement systems for photoelectric quantum efficiency and the description of technological equipment, process controls and measurement equipment, our own detailed solutions to obtain nanostructured materials support for photovoltaic cell, photovoltaic cell target material and photovoltaic cell device and results. The work was supported by national research projects carried out within teams of CMIM, IOEL and INFLPR and an important role in developing this thesis had the project called "Intelligent design of flexible photovoltaic components with maximized photoelectric conversion efficiency ". This paper materialize three years concerns of the author in the development of new photovoltaic cell test solution, the results of scientific research, conducted at the Polytechnic University of Bucharest, as scholarship of POSDRU Programme 7713 - Competitive preparing of doctoral students , are disseminated in articles, as author and co-author, published in journals and proceedings of scientific meetings.
Описание: This thesis describes the fabrication of metal-insulator-semiconductor (MIS) structures using very high permittivity dielectrics (based on rare earths) grown by high-pressure sputtering from metallic targets.
Автор: R. Behrisch Название: Sputtering by Particle Bombardment I ISBN: 3662308886 ISBN-13(EAN): 9783662308882 Издательство: Springer Рейтинг: Цена: 11753.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Автор: R. Behrisch; Rainer Behrisch; Klaus Wittmaack; W. Название: Sputtering by Particle Bombardment III ISBN: 3662311046 ISBN-13(EAN): 9783662311042 Издательство: Springer Рейтинг: Цена: 11179.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering.
Автор: R. Behrisch Название: Sputtering by Particle Bombardment II ISBN: 3662311690 ISBN-13(EAN): 9783662311691 Издательство: Springer Рейтинг: Цена: 13060.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Автор: Edward V. Barnat; Toh-Ming Lu Название: Pulsed and Pulsed Bias Sputtering ISBN: 1461350638 ISBN-13(EAN): 9781461350637 Издательство: Springer Рейтинг: Цена: 18167.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Автор: Vintizenko Название: Relativistic Magnetrons ISBN: 1138595322 ISBN-13(EAN): 9781138595323 Издательство: Taylor&Francis Рейтинг: Цена: 33686.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Relativistic high-frequency electronics has now become one of the fastest growing areas of scientific research. This reference is devoted to theoretical and experimental studies of relativistic magnetrons and is written by a leading expert who worked directly on these systems.
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