Описание: This book offers a detailed study of functional nanostructures (ferromagnetic, superconducting, metallic and semiconducting) fabricated by focused electron/ion beam induced deposition techniques.
Описание: This book offers a detailed study of functional nanostructures (ferromagnetic, superconducting, metallic and semiconducting) fabricated by focused electron/ion beam induced deposition techniques.
Автор: Yasuda Название: Magneto Luminous Chemical Vapor Deposition ISBN: 1138072095 ISBN-13(EAN): 9781138072091 Издательство: Taylor&Francis Рейтинг: Цена: 16078.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание:
The magneto luminous chemical vapor deposition (MLCVD) method is the perfect example of the "front-end green process." It employs an entirely new process that expends the minimum amount of materials in gas phase, yields virtually no effluent, and therefore requires no environmental remediation. Unlike the "back-end green process," which calls for add-on processes to deal with effluent problems, the newer MLCVD approach is a completely different phenomenon that has never been adequately described, until now.
Dispelling previous misconceptions and revealing new areas for investigation, Magneto Luminous Chemical Vapor Deposition describes the key process of dielectric breakdown of gas molecules under the influence of a magnetic field. It emphasizes behavioral distinctions between molecular gasses that cause plasma polymerization (such as methane and trimethylsilane) and mono-atomic gases (e.g., helium and argon) when dealing with the dielectric breakdown of the gas phase under low pressure. The author also reveals his minimum perturbation theory of biocompatibility. This is based on the realization that nanofilms prepared using MLCVD have unique, stable interfacial characteristics necessary to achieve a surface that can be tolerated in various biological environments.
The author presents alternating views based on NASA's recent discovery that a magnetic field burst from the earth triggers the inception of the aurora borealis. Detailing similarities between this phenomenon and the inception of the magneto luminous gas phase described in this book, the author proposes that proof of the one occurrence could shed light on the other. Expanding on the author's previous works, this book introduces new discoveries, highlights the newfound errors of previous assumptions, and juxtaposes many cutting-edge alternative views and anomalies associated with the field.
Автор: Jeffrey B. Fortin; Toh-Ming Lu Название: Chemical Vapor Deposition Polymerization ISBN: 1441954139 ISBN-13(EAN): 9781441954138 Издательство: Springer Рейтинг: Цена: 16977.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Автор: Mwema Fredrick Madaraka, Akinlabi Esther Titilayo Название: Fused Deposition Modeling: Strategies for Quality Enhancement ISBN: 3030482588 ISBN-13(EAN): 9783030482589 Издательство: Springer Рейтинг: Цена: 6986.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: In this book, fused deposition modeling (FDM) is described with focus on product quality control and enhancement. Resolution and print orientation, multi-objective optimizations and surface engineering are identified and discussed as the strategies for enhancing the quality of FDM products in this book.
Автор: K. Bruce Winterbon Название: Ion Implantation Range and Energy Deposition Distributions ISBN: 1475756143 ISBN-13(EAN): 9781475756142 Издательство: Springer Рейтинг: Цена: 13974.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Автор: Eve A. Milne Название: Layer-By-Layer Deposition: Development and Applications ISBN: 1536169838 ISBN-13(EAN): 9781536169836 Издательство: Nova Science Рейтинг: Цена: 27402.00 р. Наличие на складе: Невозможна поставка.
Описание: Layer-by-layer self-assembly is the most widely used strategy for the production of functional surfaces with tailored structures and chemical, biological, optical and electrical properties. Layer-by-layer approaches allow for the loading of bioactive molecules for tissue scaffolds, cardiovascular devices, implants, wound healing dressing, bone grafts, biosensors, drug delivery, and release systems. Layer-By-Layer Deposition: Development and Applications also examines the physico-chemical bases underlying the fabrication of materials by the layer-by-layer method. Understanding the forces involved in the control of the assembly process is essential for the fabrication of materials with controlled properties, and structures. Following this, the main principles and latest strategies of functionalized films, diamond core-shell structures, and graphene/graphene oxide nanocomposites by layer-by-layer self-assembly technology are extensively reviewed in detail, and these composites have been applied in the fields of biology, catalysis, and dye degradation. The authors study the layer-by-layer growth of quasiperiodic structures that are mathematical models of quasicrystals. This study is based on the concept of model sets proposed by Moody and generalizing the well-known "cut-and-project" method. This compilation also reviews the current state of the art uses of the layer-by-layer strategy for providing natural and synthetic textile materials with flame retardant properties, reviewing and discussing the current advances. The penultimate study focuses on how nisin peptides can be entrapped and released, creating an antibacterial food-contacting textile membrane. Biocatalytic membranes can be fabricated using entrapped enzymes. Lastly, the different issues of multilayer emulsions with flaxseed and chia seed oil as omega-3 sources will be discussed, including their formation, composition, stability, characterization, and application.
Автор: Donald Smith Название: Thin-Film Deposition: Principles and Practice ISBN: 0070585024 ISBN-13(EAN): 9780070585027 Издательство: McGraw-Hill Рейтинг: Цена: 19561.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Offers a complete description of the theory and technology of thin film deposition. This book offers a broad perspective, and gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. It also includes a list of symbols and an extensive index.
Описание: The book presents an up-to-date review of turbulent two-phase flows with the dispersed phase, with an emphasis on the dynamics in the near-wall region. Also included are models of particle dynamics in wall-bounded turbulent flows, and a description of particle surface interactions including muti-layer deposition and re-suspension.
Автор: Oscar Alejandro Oviedo; Luis Reinaudi; Silvana Gar Название: Underpotential Deposition ISBN: 3319243926 ISBN-13(EAN): 9783319243924 Издательство: Springer Рейтинг: Цена: 18284.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: They also discuss real surface determinations and layer-by-layer growth of ultrathin films, as well as the very latest modeling approaches to UPD based on nanothermodynamics, statistical mechanics, molecular dynamics and Monte-Carlo simulations.
Cluster Beam Deposition of Functional Nanomaterials and Devices, Volume 15, provides up-to-date information on the CBD of novel nanomaterials and devices. The book offers an overview of gas phase synthesis in a range of nanoparticles, along with discussions on the development of several devices and applications. Applications include, but are not limited to catalysis, smart nanocomposites, nanoprobes, electronic devices, gas sensors and biosensors. This is an important reference source for materials scientists and engineers who want to learn more about this sustainable, innovative manufacturing technology.
Автор: Barry Seбn Thomas Название: Chemistry of Atomic Layer Deposition ISBN: 3110712512 ISBN-13(EAN): 9783110712513 Издательство: Walter de Gruyter Рейтинг: Цена: 12689.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание:
This book will help chemists and non-chemists alike understand the fundamentals of surface chemistry and precursor design, and how these precursors drive the processes of atomic layer deposition, and how the surface-precursor interaction governs atomic layer deposition processes. The underlying principles in atomic layer deposition rely on the chemistry of a precursor with a surface.
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