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Chemistry of Atomic Layer Deposition, Barry Seбn Thomas


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Цена: 12689.00р.
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Автор: Barry Seбn Thomas
Название:  Chemistry of Atomic Layer Deposition
ISBN: 9783110712513
Издательство: Walter de Gruyter
Издательство: de Gruyter
Классификация:




ISBN-10: 3110712512
Обложка/Формат: Paperback
Страницы: 113
Вес: 0.20 кг.
Дата издания: 22.11.2021
Серия: De gruyter textbook
Язык: English
Иллюстрации: 20 tables, black and white; 5 illustrations, black and white; 70 illustrations, color
Размер: 24.41 x 16.99 x 3.28 cm
Читательская аудитория: Tertiary education (us: college)
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Поставляется из: США
Описание:

This book will help chemists and non-chemists alike understand the fundamentals of surface chemistry and precursor design, and how these precursors drive the processes of atomic layer deposition, and how the surface-precursor interaction governs atomic layer deposition processes. The underlying principles in atomic layer deposition rely on the chemistry of a precursor with a surface.




Cluster Beam Deposition Of Functional Nanomaterials And Devices,15

Автор: Milani, Paolo
Название: Cluster Beam Deposition Of Functional Nanomaterials And Devices,15
ISBN: 0081025157 ISBN-13(EAN): 9780081025154
Издательство: Elsevier Science
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Цена: 28633.00 р.
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Описание:

Cluster Beam Deposition of Functional Nanomaterials and Devices, Volume 15, provides up-to-date information on the CBD of novel nanomaterials and devices. The book offers an overview of gas phase synthesis in a range of nanoparticles, along with discussions on the development of several devices and applications. Applications include, but are not limited to catalysis, smart nanocomposites, nanoprobes, electronic devices, gas sensors and biosensors. This is an important reference source for materials scientists and engineers who want to learn more about this sustainable, innovative manufacturing technology.

Atomic Layer Deposition for Semiconductors

Автор: Cheol Seong Hwang
Название: Atomic Layer Deposition for Semiconductors
ISBN: 1489979433 ISBN-13(EAN): 9781489979438
Издательство: Springer
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Цена: 13059.00 р.
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Описание: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Atomic Layer Deposition for Semiconductors

Автор: Cheol Seong Hwang
Название: Atomic Layer Deposition for Semiconductors
ISBN: 1461480531 ISBN-13(EAN): 9781461480532
Издательство: Springer
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Цена: 15672.00 р.
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Описание: This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines.

Magneto Luminous Chemical Vapor Deposition

Автор: Yasuda
Название: Magneto Luminous Chemical Vapor Deposition
ISBN: 1138072095 ISBN-13(EAN): 9781138072091
Издательство: Taylor&Francis
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Цена: 16078.00 р.
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Описание:

The magneto luminous chemical vapor deposition (MLCVD) method is the perfect example of the "front-end green process." It employs an entirely new process that expends the minimum amount of materials in gas phase, yields virtually no effluent, and therefore requires no environmental remediation. Unlike the "back-end green process," which calls for add-on processes to deal with effluent problems, the newer MLCVD approach is a completely different phenomenon that has never been adequately described, until now.

Dispelling previous misconceptions and revealing new areas for investigation, Magneto Luminous Chemical Vapor Deposition describes the key process of dielectric breakdown of gas molecules under the influence of a magnetic field. It emphasizes behavioral distinctions between molecular gasses that cause plasma polymerization (such as methane and trimethylsilane) and mono-atomic gases (e.g., helium and argon) when dealing with the dielectric breakdown of the gas phase under low pressure. The author also reveals his minimum perturbation theory of biocompatibility. This is based on the realization that nanofilms prepared using MLCVD have unique, stable interfacial characteristics necessary to achieve a surface that can be tolerated in various biological environments.

The author presents alternating views based on NASA's recent discovery that a magnetic field burst from the earth triggers the inception of the aurora borealis. Detailing similarities between this phenomenon and the inception of the magneto luminous gas phase described in this book, the author proposes that proof of the one occurrence could shed light on the other. Expanding on the author's previous works, this book introduces new discoveries, highlights the newfound errors of previous assumptions, and juxtaposes many cutting-edge alternative views and anomalies associated with the field.

Chemical Vapour Deposition (Cvd)

Автор: Choy
Название: Chemical Vapour Deposition (Cvd)
ISBN: 1466597763 ISBN-13(EAN): 9781466597761
Издательство: Taylor&Francis
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Цена: 26796.00 р.
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Описание: This book provides an introduction to the use of Chemical Vapor Deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites.

Layer-By-Layer Deposition: Development and Applications

Автор: Eve A. Milne
Название: Layer-By-Layer Deposition: Development and Applications
ISBN: 1536169838 ISBN-13(EAN): 9781536169836
Издательство: Nova Science
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Цена: 27402.00 р.
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Описание: Layer-by-layer self-assembly is the most widely used strategy for the production of functional surfaces with tailored structures and chemical, biological, optical and electrical properties. Layer-by-layer approaches allow for the loading of bioactive molecules for tissue scaffolds, cardiovascular devices, implants, wound healing dressing, bone grafts, biosensors, drug delivery, and release systems. Layer-By-Layer Deposition: Development and Applications also examines the physico-chemical bases underlying the fabrication of materials by the layer-by-layer method. Understanding the forces involved in the control of the assembly process is essential for the fabrication of materials with controlled properties, and structures. Following this, the main principles and latest strategies of functionalized films, diamond core-shell structures, and graphene/graphene oxide nanocomposites by layer-by-layer self-assembly technology are extensively reviewed in detail, and these composites have been applied in the fields of biology, catalysis, and dye degradation. The authors study the layer-by-layer growth of quasiperiodic structures that are mathematical models of quasicrystals. This study is based on the concept of model sets proposed by Moody and generalizing the well-known "cut-and-project" method. This compilation also reviews the current state of the art uses of the layer-by-layer strategy for providing natural and synthetic textile materials with flame retardant properties, reviewing and discussing the current advances. The penultimate study focuses on how nisin peptides can be entrapped and released, creating an antibacterial food-contacting textile membrane. Biocatalytic membranes can be fabricated using entrapped enzymes. Lastly, the different issues of multilayer emulsions with flaxseed and chia seed oil as omega-3 sources will be discussed, including their formation, composition, stability, characterization, and application.

Deposition of Diamond-Like Superhard Materials

Автор: Wilhelm A.M. Kulisch
Название: Deposition of Diamond-Like Superhard Materials
ISBN: 366215627X ISBN-13(EAN): 9783662156278
Издательство: Springer
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Цена: 13974.00 р.
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Описание: This book deals with the deposition of a certain class of materials, namely the diamond-like superhard materials, in the form of thin films. Starting from concepts used to improve the hardness of a material, it is shown that the intrinsic hardness is highest for materials with low bond lengths, high coordination numbers, and low ionicities.

Handbook of Physical Vapor Deposition (PVD) Processing,

Автор: Donald M. Mattox
Название: Handbook of Physical Vapor Deposition (PVD) Processing,
ISBN: 0815520379 ISBN-13(EAN): 9780815520375
Издательство: Elsevier Science
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Цена: 38908.00 р.
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Описание: Explains various aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing.

Chemical Vapour Deposition

Автор: Xiu-Tian Yan; Yongdong Xu
Название: Chemical Vapour Deposition
ISBN: 1848828934 ISBN-13(EAN): 9781848828933
Издательство: Springer
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Цена: 26122.00 р.
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Описание: Chemical Vapour Deposition explores the design capabilities and applications of advanced materials. From physical fundamentals to the optimization of processing parameters, this volume presents the development and manufacture of high performance materials.

Functional Nanostructures Fabricated by Focused Electron/Ion Beam Induced Deposition

Автор: Rosa C?rdoba Castillo
Название: Functional Nanostructures Fabricated by Focused Electron/Ion Beam Induced Deposition
ISBN: 3319375539 ISBN-13(EAN): 9783319375533
Издательство: Springer
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Цена: 13059.00 р.
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Описание: This book offers a detailed study of functional nanostructures (ferromagnetic, superconducting, metallic and semiconducting) fabricated by focused electron/ion beam induced deposition techniques.

Chemical Vapor Deposition Polymerization

Автор: Jeffrey B. Fortin; Toh-Ming Lu
Название: Chemical Vapor Deposition Polymerization
ISBN: 1441954139 ISBN-13(EAN): 9781441954138
Издательство: Springer
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Цена: 16977.00 р.
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Ion Implantation Range and Energy Deposition Distributions

Автор: K. Bruce Winterbon
Название: Ion Implantation Range and Energy Deposition Distributions
ISBN: 1475756143 ISBN-13(EAN): 9781475756142
Издательство: Springer
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Цена: 13974.00 р.
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