Atomic Layer Deposition for Semiconductors, Cheol Seong Hwang

Автор: Kiyotaka Wasa
Название: Handbook of Sputter Deposition Technology,
ISBN: 1437734839 ISBN-13(EAN): 9781437734836
Издательство: Elsevier Science
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Цена: 21054.00 р.
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Описание: Faetures a team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. This book introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.

Автор: Cheol Seong Hwang
Название: Atomic Layer Deposition for Semiconductors
ISBN: 1461480531 ISBN-13(EAN): 9781461480532
Издательство: Springer
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Цена: 15672.00 р.
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Описание: This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines.

Автор: Theodor Schneller; Rainer Waser; Marija Kosec; Dav
Название: Chemical Solution Deposition of Functional Oxide Thin Films
ISBN: 3709119154 ISBN-13(EAN): 9783709119150
Издательство: Springer
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Цена: 26120.00 р.
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Описание: Chemical Solution Deposition (CSD) is a highly-flexible and inexpensive technique for the fabrication of functional oxide thin films. Featuring nearly 400 illustrations, this text covers all aspects of the technique.

Автор: Srinivasan Sivaram
Название: Chemical Vapor Deposition
ISBN: 1475747535 ISBN-13(EAN): 9781475747539
Издательство: Springer
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Цена: 14365.00 р.
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Описание: Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition.

Автор: J. Mazumder; Aravinda Kar
Название: Theory and Application of Laser Chemical Vapor Deposition
ISBN: 1489914323 ISBN-13(EAN): 9781489914323
Издательство: Springer
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Цена: 20962.00 р.
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Описание: In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption.

Автор: Chris R. Kleijn; Christoph Werner
Название: Modeling of Chemical Vapor Deposition of Tungsten Films
ISBN: 3034877439 ISBN-13(EAN): 9783034877435
Издательство: Springer
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Цена: 6986.00 р.
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Описание: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors.