Theory and Application of Laser Chemical Vapor Deposition, J. Mazumder; Aravinda Kar

Автор: Srinivasan Sivaram
Название: Chemical Vapor Deposition
ISBN: 1475747535 ISBN-13(EAN): 9781475747539
Издательство: Springer
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Цена: 14365.00 р.
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Описание: Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition.

Автор: Chris R. Kleijn; Christoph Werner
Название: Modeling of Chemical Vapor Deposition of Tungsten Films
ISBN: 3034877439 ISBN-13(EAN): 9783034877435
Издательство: Springer
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Цена: 6986.00 р.
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Описание: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors.

Автор: Kiyotaka Wasa
Название: Handbook of Sputter Deposition Technology,
ISBN: 1437734839 ISBN-13(EAN): 9781437734836
Издательство: Elsevier Science
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Цена: 21054.00 р.
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Описание: Faetures a team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. This book introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.

Автор: Cheol Seong Hwang
Название: Atomic Layer Deposition for Semiconductors
ISBN: 1489979433 ISBN-13(EAN): 9781489979438
Издательство: Springer
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Цена: 13059.00 р.
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Описание: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Автор: Cheol Seong Hwang
Название: Atomic Layer Deposition for Semiconductors
ISBN: 1461480531 ISBN-13(EAN): 9781461480532
Издательство: Springer
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Цена: 15672.00 р.
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Описание: This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines.

Автор: Oscar Alejandro Oviedo; Luis Reinaudi; Silvana Gar
Название: Underpotential Deposition
ISBN: 3319243926 ISBN-13(EAN): 9783319243924
Издательство: Springer
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Цена: 18284.00 р.
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Описание: They also discuss real surface determinations and layer-by-layer growth of ultrathin films, as well as the very latest modeling approaches to UPD based on nanothermodynamics, statistical mechanics, molecular dynamics and Monte-Carlo simulations.