Ion Implantation Range and Energy Deposition Distributions, K. Bruce Winterbon
Автор: Emanuele Rimini Название: Ion Implantation: Basics to Device Fabrication ISBN: 146135952X ISBN-13(EAN): 9781461359524 Издательство: Springer Рейтинг: Цена: 26122.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics.
Автор: Michael Nastasi; James W. Mayer Название: Ion Implantation and Synthesis of Materials ISBN: 3642062598 ISBN-13(EAN): 9783642062599 Издательство: Springer Рейтинг: Цена: 16977.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Ion implantation is one of the key processing steps in silicon integrated circuit technology. This book presents the physics and materials science of ion implantation and ion beam modification of materials.
Автор: Kiyotaka Wasa Название: Handbook of Sputter Deposition Technology, ISBN: 1437734839 ISBN-13(EAN): 9781437734836 Издательство: Elsevier Science Рейтинг: Цена: 21054.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Faetures a team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. This book introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.
Автор: J. Mazumder; O. Conde; R. Vilar; W. Steen Название: Laser Processing: Surface Treatment and Film Deposition ISBN: 9401065721 ISBN-13(EAN): 9789401065726 Издательство: Springer Рейтинг: Цена: 12157.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Proceedings of the NATO Advanced Study Institute, Sesimbra, Portugal, July 3-16, 1994
Автор: Xiu-Tian Yan; Yongdong Xu Название: Chemical Vapour Deposition ISBN: 1848828934 ISBN-13(EAN): 9781848828933 Издательство: Springer Рейтинг: Цена: 26122.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Chemical Vapour Deposition explores the design capabilities and applications of advanced materials. From physical fundamentals to the optimization of processing parameters, this volume presents the development and manufacture of high performance materials.
Автор: Wilhelm A.M. Kulisch Название: Deposition of Diamond-Like Superhard Materials ISBN: 366215627X ISBN-13(EAN): 9783662156278 Издательство: Springer Рейтинг: Цена: 13974.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: This book deals with the deposition of a certain class of materials, namely the diamond-like superhard materials, in the form of thin films. Starting from concepts used to improve the hardness of a material, it is shown that the intrinsic hardness is highest for materials with low bond lengths, high coordination numbers, and low ionicities.
Автор: A. H. Agajanian Название: Ion Implantation in Microelectronics ISBN: 1468461346 ISBN-13(EAN): 9781468461343 Издательство: Springer Рейтинг: Цена: 13974.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: During the past ten years the use of ion implantation for doping semiconductors has become an active area of research and new device development. The main sources searched were: Physics Abstracts (PA) , Electrical and Electronics Abstracts (EEA) , Chemical Abstracts (CA) , Nuclear Science Abstracts (NSA) , and Engineering Index.
Автор: H. Ryssel; H. Glawischnig Название: Ion Implantation Techniques ISBN: 3642687814 ISBN-13(EAN): 9783642687815 Издательство: Springer Рейтинг: Цена: 18284.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech- niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech- niques, held at Queen's University, ' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan- tation conference for the first time. This implantation school concentra- ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con- trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap- ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec- tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given.
Описание: This book offers a detailed study of functional nanostructures (ferromagnetic, superconducting, metallic and semiconducting) fabricated by focused electron/ion beam induced deposition techniques.
Описание: This book offers a detailed study of functional nanostructures (ferromagnetic, superconducting, metallic and semiconducting) fabricated by focused electron/ion beam induced deposition techniques.
Автор: Jeffrey B. Fortin; Toh-Ming Lu Название: Chemical Vapor Deposition Polymerization ISBN: 1441954139 ISBN-13(EAN): 9781441954138 Издательство: Springer Рейтинг: Цена: 16977.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Автор: Theodor Schneller; Rainer Waser; Marija Kosec; Dav Название: Chemical Solution Deposition of Functional Oxide Thin Films ISBN: 3709119154 ISBN-13(EAN): 9783709119150 Издательство: Springer Рейтинг: Цена: 26120.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Chemical Solution Deposition (CSD) is a highly-flexible and inexpensive technique for the fabrication of functional oxide thin films. Featuring nearly 400 illustrations, this text covers all aspects of the technique.
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