Ion Implantation in Microelectronics, A. H. Agajanian

Автор: J. Greer
Название: Nano and Giga Challenges in Microelectronics,
ISBN: 0444514945 ISBN-13(EAN): 9780444514943
Издательство: Elsevier Science
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Цена: 16843.00 р.
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Описание: Gives an introduction for engineers and researchers wishing to obtain a fundamental knowledge of the edge in technology research. This book also acts as an essential reference for the "gurus" wishing to keep abreast of the directions and challenges in microelectronic technology development and future trends.

Автор: Jose Martinez-Duart
Название: Nanotechnology for Microelectronics and Optoelectronics,
ISBN: 0080445535 ISBN-13(EAN): 9780080445533
Издательство: Elsevier Science
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Цена: 26528.00 р.
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Описание: When solids are reduced to the nanometer scale, they exhibit new and exciting behaviours which constitute the basis for a new generation of electronic devices. This title outlines the fundamental solid-state physics concepts that explain the properties of matter caused by this reduction of solids to the nanometer scale.

Автор: G.Q. Zhang; W.D. van Driel; X.J. Fan
Название: Mechanics of Microelectronics
ISBN: 9048172314 ISBN-13(EAN): 9789048172313
Издательство: Springer
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Цена: 30039.00 р.
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Описание: This book is written by leading experts with both profound knowledge and rich practical experience in advanced mechanics and the microelectronics industry essential for current and future development. It aims to provide the cutting edge knowledge and solutions for various mechanical related problems, in a systematic way.

Автор: Tomi Laurila; Vesa Vuorinen; Mervi Paulasto-Kr?cke
Название: Interfacial Compatibility in Microelectronics
ISBN: 1447160681 ISBN-13(EAN): 9781447160687
Издательство: Springer
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Цена: 18284.00 р.
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Описание: This book provides solutions to several common reliability issues in microsystem packaging. It teaches the reader methods to understand and predict failure mechanisms at interfaces between dissimilar materials.

Автор: H. Ryssel; H. Glawischnig
Название: Ion Implantation Techniques
ISBN: 3642687814 ISBN-13(EAN): 9783642687815
Издательство: Springer
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Цена: 18284.00 р.
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Описание: In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech- niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech- niques, held at Queen's University, ' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan- tation conference for the first time. This implantation school concentra- ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con- trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap- ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec- tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given.

Автор: Emanuele Rimini
Название: Ion Implantation: Basics to Device Fabrication
ISBN: 146135952X ISBN-13(EAN): 9781461359524
Издательство: Springer
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Цена: 26122.00 р.
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Описание: Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics.

Автор: Michael Nastasi; James W. Mayer
Название: Ion Implantation and Synthesis of Materials
ISBN: 3642062598 ISBN-13(EAN): 9783642062599
Издательство: Springer
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Цена: 16977.00 р.
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Описание: Ion implantation is one of the key processing steps in silicon integrated circuit technology. This book presents the physics and materials science of ion implantation and ion beam modification of materials.

Автор: K. Bruce Winterbon
Название: Ion Implantation Range and Energy Deposition Distributions
ISBN: 1475756143 ISBN-13(EAN): 9781475756142
Издательство: Springer
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Цена: 13974.00 р.
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