Ion Implantation and Synthesis of Materials, Michael Nastasi; James W. Mayer
Автор: Emanuele Rimini Название: Ion Implantation: Basics to Device Fabrication ISBN: 146135952X ISBN-13(EAN): 9781461359524 Издательство: Springer Рейтинг: Цена: 26122.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics.
Описание: This second edition of Nanocrystalline Materials provides updated information on the development and experimental work on the synthesis, properties, and applications of nanocrystalline materials. Nanocrystalline materials with new functionalities show great promise for use in industrial applications — such as reinforcing fillers in novel polymer composites — and substantial progress has been made in the past decade in their synthesis and processing. . This book focuses primarily on 1D semiconducting oxides and carbon nanotubes, 2D graphene sheets and 0D nanoparticles (metals and inorganic semiconductors). These materials are synthesized under different compositions, shapes and structures, exhibiting different chemical, physical and mechanical properties from their bulk counterparts. . This second edition presents new topics relevant to the fast-paced development of nanoscience and nanotechnology, including the synthesis and application of nanomaterials for drug delivery, energy, printed flash memory, and luminescent materials. With contributions from leading experts, this book describes the fundamental theories and concepts that illustrate the complexity of developing novel nanocrystalline materials, and reviews current knowledge in the synthesis, microstructural characterization, physical and mechanical behavior, and application of nanomaterials.
Описание: This textbook is an accessible overview of the broad field oforganic electrochemistry, covering the fundamentals andapplications of contemporary organic electrochemistry. Thebook begins with an introduction to the fundamental aspects ofelectrode electron transfer and methods for the electrochemicalmeasurement of organic molecules. It then goes on to discussorganic electrosynthesis of molecules and macromolecules, includingdetailed experimental information for the electrochemical synthesisof organic compounds and conducting polymers. Later chaptershighlight new methodology for organic electrochemical synthesis, for example electrolysis in ionic liquids, the application toorganic electronic devices such as solar cells and LEDs, andexamples of commercialized organic electrode processes. Appendicespresent useful supplementary information including experimentalexamples of organic electrosynthesis, and tables of physical data(redox potentials of various organic solvents and organic compoundsand physical properties of various organic solvents).
Описание: Serving as the only systematic and comprehensive treatment on the topic of nanoparticle-based materials, this book covers synthesis, characterization, assembly, shaping and sintering of all types of nanoparticles including metals, ceramics, and semiconductors. A single-authored work, it is suitable as a graduate-level text in nanomaterials courses.
Автор: Billy Crowder Название: Ion Implantation in Semiconductors and Other Materials ISBN: 1468420666 ISBN-13(EAN): 9781468420661 Издательство: Springer Рейтинг: Цена: 13974.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: During the years since the first conference in this series was held at Thousand Oaks, California, in 1970, ion implantation has been an expanding and exciting research area.
Автор: H. Ryssel; H. Glawischnig Название: Ion Implantation Techniques ISBN: 3642687814 ISBN-13(EAN): 9783642687815 Издательство: Springer Рейтинг: Цена: 18284.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech- niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech- niques, held at Queen's University, ' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan- tation conference for the first time. This implantation school concentra- ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con- trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap- ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec- tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given.
Автор: H. Ryssel; H. Glawischnig Название: Ion Implantation: Equipment and Techniques ISBN: 3642691587 ISBN-13(EAN): 9783642691584 Издательство: Springer Рейтинг: Цена: 19591.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: The Fourth International Conference on Ion Implantation: Equipment and Tech- niques was held at the Convention Center in Berchtesgaden, Bavaria, Germany, from September 13 to 17, 1982. It was attended by more than 200 participants from over 20 different countries. Severa1 series of conferences have dealt with the app1ication of ion implantation to semiconductors and other materials (Thousand Oaks, 1970; Garmisch-Partenkirchen, 1971; Osaka, 1974; Warwick, 1975; Bou1der, 1975; Budapest, 1978; and Albany, 1980). Another series of conferences has been devoted to implantation equipment and techniques (S- ford, 1977; Trento, 1978; and Kingston, 1980). This conference was the fourth in the 1atter series. Twe1ve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and app1ica- tions of implantation to metals and semiconductors. A schoo1 on ion implantation was held in connection with the conference, and the 1ectures presented at this schoo1 were pub1ished as Vo1. 10 of the Springer Series in E1ectrophysics under the tit1e Ion Implantation Techniques (edited by H. Rysse1 and H. G1awischnig). During the conference, space was also provided for presentations and demonstrations by manufacturers of ion implantation equipment. Once again, this conference provided a forum for free discussion among implantation specia1ists in industry as we11 as research institutions. Espe- cially effective in stimulating a free exchange of information was the daily get-together over free beer at the "Bier Adam". Many people contributed to the success of this conference.
Автор: Ingolf Ruge; J. Graul Название: Ion Implantation in Semiconductors ISBN: 3642806627 ISBN-13(EAN): 9783642806629 Издательство: Springer Рейтинг: Цена: 15372.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: In recent years great progress has been made in the field of ion implantation, particularly with respect to applications in semiconductors. International Conference on Ion Implantation in Semiconductors within the rather short time of one year since the first conference was held in 1970 in Thousand Oaks, California.
Автор: A. H. Agajanian Название: Ion Implantation in Microelectronics ISBN: 1468461346 ISBN-13(EAN): 9781468461343 Издательство: Springer Рейтинг: Цена: 13974.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: During the past ten years the use of ion implantation for doping semiconductors has become an active area of research and new device development. The main sources searched were: Physics Abstracts (PA) , Electrical and Electronics Abstracts (EEA) , Chemical Abstracts (CA) , Nuclear Science Abstracts (NSA) , and Engineering Index.
Автор: Susumu Namba Название: Ion Implantation in Semiconductors ISBN: 1468421530 ISBN-13(EAN): 9781468421538 Издательство: Springer Рейтинг: Цена: 6986.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: The technique of ion implantation has become a very useful and stable technique in the field of semiconductor device fabrication. This scope of the conference was still accepted at the fourth conference which was held at Osaka, Japan, in 1974.
Автор: K. Bruce Winterbon Название: Ion Implantation Range and Energy Deposition Distributions ISBN: 1475756143 ISBN-13(EAN): 9781475756142 Издательство: Springer Рейтинг: Цена: 13974.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Автор: Heinrich Planck; Martin Dauner; Monika Renardy Название: Medical Textiles for Implantation ISBN: 3642758045 ISBN-13(EAN): 9783642758041 Издательство: Springer Рейтинг: Цена: 6986.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Proceedings of the 3rd International ITV Conference on Biomaterials, Stuttgart, June 14-16, 1989
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