Ion Implantation in Semiconductors, Susumu Namba

Автор: Bengt G. Svensson
Название: Oxide Semiconductors,88
ISBN: 012396489X ISBN-13(EAN): 9780123964892
Издательство: Elsevier Science
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Описание: Suitable for physicists, chemists, materials scientists, and device engineers in academia, scientific laboratories and modern industry.

Автор: Billy Crowder
Название: Ion Implantation in Semiconductors and Other Materials
ISBN: 1468420666 ISBN-13(EAN): 9781468420661
Издательство: Springer
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Описание: During the years since the first conference in this series was held at Thousand Oaks, California, in 1970, ion implantation has been an expanding and exciting research area.

Автор: H. Ryssel; H. Glawischnig
Название: Ion Implantation Techniques
ISBN: 3642687814 ISBN-13(EAN): 9783642687815
Издательство: Springer
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Описание: In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech- niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech- niques, held at Queen's University, ' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan- tation conference for the first time. This implantation school concentra- ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con- trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap- ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec- tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given.

Автор: H. Ryssel; H. Glawischnig
Название: Ion Implantation: Equipment and Techniques
ISBN: 3642691587 ISBN-13(EAN): 9783642691584
Издательство: Springer
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Описание: The Fourth International Conference on Ion Implantation: Equipment and Tech- niques was held at the Convention Center in Berchtesgaden, Bavaria, Germany, from September 13 to 17, 1982. It was attended by more than 200 participants from over 20 different countries. Severa1 series of conferences have dealt with the app1ication of ion implantation to semiconductors and other materials (Thousand Oaks, 1970; Garmisch-Partenkirchen, 1971; Osaka, 1974; Warwick, 1975; Bou1der, 1975; Budapest, 1978; and Albany, 1980). Another series of conferences has been devoted to implantation equipment and techniques (S- ford, 1977; Trento, 1978; and Kingston, 1980). This conference was the fourth in the 1atter series. Twe1ve invited papers and 55 contributed papers covered the areas of ion implantation equipment, measuring techniques, and app1ica- tions of implantation to metals and semiconductors. A schoo1 on ion implantation was held in connection with the conference, and the 1ectures presented at this schoo1 were pub1ished as Vo1. 10 of the Springer Series in E1ectrophysics under the tit1e Ion Implantation Techniques (edited by H. Rysse1 and H. G1awischnig). During the conference, space was also provided for presentations and demonstrations by manufacturers of ion implantation equipment. Once again, this conference provided a forum for free discussion among implantation specia1ists in industry as we11 as research institutions. Espe- cially effective in stimulating a free exchange of information was the daily get-together over free beer at the "Bier Adam". Many people contributed to the success of this conference.

Автор: Michael Nastasi; James W. Mayer
Название: Ion Implantation and Synthesis of Materials
ISBN: 3642062598 ISBN-13(EAN): 9783642062599
Издательство: Springer
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Описание: Ion implantation is one of the key processing steps in silicon integrated circuit technology. This book presents the physics and materials science of ion implantation and ion beam modification of materials.

Автор: Khler Anna
Название: Electronic Processes in Organic Semiconductors
ISBN: 3527332928 ISBN-13(EAN): 9783527332922
Издательство: Wiley
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Описание: The first advanced textbook to focus on the fundamentals in a brief, coherent and comprehensive way. Based on one of the author`s proven lecture course, it prepares students to understand the many multi-authored books available that discuss a particular aspect in more detail.

Автор: Fred Chernow
Название: Ion Implantation in Semiconductors 1976
ISBN: 1461341981 ISBN-13(EAN): 9781461341987
Издательство: Springer
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Описание: The Fifth International Conference on Ion Implantation took place in Boulder, Colorado between the 9th and 13th of August 1976.

Автор: Ingolf Ruge; J. Graul
Название: Ion Implantation in Semiconductors
ISBN: 3642806627 ISBN-13(EAN): 9783642806629
Издательство: Springer
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Описание: In recent years great progress has been made in the field of ion implantation, particularly with respect to applications in semiconductors. International Conference on Ion Implantation in Semiconductors within the rather short time of one year since the first conference was held in 1970 in Thousand Oaks, California.

Автор: Heinrich Planck; Martin Dauner; Monika Renardy
Название: Medical Textiles for Implantation
ISBN: 3642758045 ISBN-13(EAN): 9783642758041
Издательство: Springer
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Описание: Proceedings of the 3rd International ITV Conference on Biomaterials, Stuttgart, June 14-16, 1989

Автор: Mikla, Victor V.
Название: Trap Level Spectroscopy in Amorphous Semiconductors
ISBN: 0323165036 ISBN-13(EAN): 9780323165037
Издательство: Elsevier Science
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Описание: Although amorphous semiconductors have been studied for over four decades, many of their properties are not fully understood. This book discusses not only the most common spectroscopic techniques but also describes their advantages and disadvantages.