Chemical Vapour Deposition (Cvd), Choy

Автор: Xiu-Tian Yan; Yongdong Xu
Название: Chemical Vapour Deposition
ISBN: 1447125509 ISBN-13(EAN): 9781447125501
Издательство: Springer
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Цена: 26120.00 р.
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Описание: Chemical Vapour Deposition explores the design capabilities and applications of advanced materials. From physical fundamentals to the optimization of processing parameters, this volume presents the development and manufacture of high performance materials.

Автор: Kiyotaka Wasa
Название: Handbook of Sputter Deposition Technology,
ISBN: 1437734839 ISBN-13(EAN): 9781437734836
Издательство: Elsevier Science
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Цена: 21054.00 р.
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Описание: Faetures a team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. This book introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.

Автор: Donald M. Mattox
Название: Handbook of Physical Vapor Deposition (PVD) Processing,
ISBN: 0815520379 ISBN-13(EAN): 9780815520375
Издательство: Elsevier Science
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Цена: 38908.00 р.
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Описание: Explains various aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing.

Автор: Depla
Название: Reactive Sputter Deposition
ISBN: 3540766626 ISBN-13(EAN): 9783540766629
Издательство: Springer
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Цена: 32142.00 р.
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Описание: In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process.

Автор: Charles Bishop
Название: Vacuum Deposition onto Webs, Films and Foils
ISBN: 0323296440 ISBN-13(EAN): 9780323296441
Издательство: Elsevier Science
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Цена: 26949.00 р.
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Описание: . Vacuum Deposition onto Webs: Films and Foils, Third Edition, provides the latest information on vacuum deposition, the technology that applies an even coating to a flexible material that can be held on a roll, thereby offering a much faster and cheaper method of bulk coating than deposition onto single pieces or non-flexible surfaces such as glass. . This technology has been used in industrial-scale applications for some time, including a wide range of metalized packaging. Its potential as a high-speed, scalable process has seen an increasing range of new products emerging that employ this cost-effective technology, including solar energy products that are moving from rigid panels onto cheaper and more versatile flexible substrates, flexible electronic circuit ‘boards’, and flexible displays. In this third edition, all chapters are thoroughly revised with a significant amount of new information added, including newly developed barrier measurement techniques, improved in-vacuum monitoring technologies, and the latest developments in Atomic Layer Deposition (ALD).

Автор: Xiu-Tian Yan; Yongdong Xu
Название: Chemical Vapour Deposition
ISBN: 1848828934 ISBN-13(EAN): 9781848828933
Издательство: Springer
Рейтинг:
Цена: 26122.00 р.
Наличие на складе: Есть у поставщика Поставка под заказ.

Описание: Chemical Vapour Deposition explores the design capabilities and applications of advanced materials. From physical fundamentals to the optimization of processing parameters, this volume presents the development and manufacture of high performance materials.