Handbook Of Silicon Wafer Cleaning Technology, Reinhardt, Karen
Новое издание
Автор: Reinhardt, Karen Название: Handbook of Silicon Wafer Cleaning Technology ISBN: 0323510841 ISBN-13(EAN): 9780323510844 Издательство: Elsevier Science Цена: 39582.00 р. Наличие на складе: Поставка под заказ. Описание:
Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results.
The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination.
The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others.
Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits
Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries
Covers processes and equipment, as well as new materials and changes required for the surface conditioning process
Автор: Reinhardt, Karen Название: Handbook of Silicon Wafer Cleaning Technology ISBN: 0323510841 ISBN-13(EAN): 9780323510844 Издательство: Elsevier Science Рейтинг: Цена: 39582.00 р. Наличие на складе: Поставка под заказ.
Описание:
Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results.
The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination.
The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others.
Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits
Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries
Covers processes and equipment, as well as new materials and changes required for the surface conditioning process
Описание: Three types of sensors are introduced: on-wafer UV sensors, on-wafer charge-up sensors and on-wafer sheath-shape sensors in the plasma processing and prediction system of real etching profiles based on monitoring data.
Автор: Deren Yang Название: Handbook of Photovoltaic Silicon ISBN: 3662564718 ISBN-13(EAN): 9783662564714 Издательство: Springer Рейтинг: Цена: 104815.00 р. Наличие на складе: Поставка под заказ.
Описание: The utilization of sun light is one of the hottest topics in sustainable energy research. To efficiently convert sun power into a reliable energy – electricity – for consumption and storage, silicon and its derivatives have been widely studied and applied in solar cell systems. This handbook covers the photovoltaics of silicon materials and devices, providing a comprehensive summary of the state of the art of photovoltaic silicon sciences and technologies. This work is divided into various areas including but not limited to fundamental principles, design methodologies, wafering techniques/fabrications, characterizations, applications, current research trends and challenges. It offers the most updated and self-explanatory reference to all levels of students and acts as a quick reference to the experts from the fields of chemistry, material science, physics, chemical engineering, electrical engineering, solar energy, etc..
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