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Advanced Nano Deposition Methods, Lin


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Цена: 18366.00р.
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Автор: Lin
Название:  Advanced Nano Deposition Methods
ISBN: 9783527340255
Издательство: Wiley
Классификация:

ISBN-10: 3527340254
Обложка/Формат: Hardback
Страницы: 328
Вес: 0.84 кг.
Дата издания: 2016
Язык: English
Размер: 249 x 173 x 20
Читательская аудитория: Professional & vocational
Основная тема: Thin Films, Surfaces & Interfaces
Ссылка на Издательство: Link
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Поставляется из: Англии


Molecular layer deposition for tailored organic thin-film materials /

Автор: Yoshimura, Tetsuzo,
Название: Molecular layer deposition for tailored organic thin-film materials /
ISBN: 0367554747 ISBN-13(EAN): 9780367554743
Издательство: Taylor&Francis
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Цена: 22968.00 р.
Наличие на складе: Нет в наличии.

Описание: This book provides concepts and experimental demonstrations for various types of MLD and organic multiple quantum dots (Organic MQDs), which is a typical tailored organic thin-film material. Possible applications of MLD to optical interconnects, energy conversion systems, molecular targeted drug delivery, and cancer therapy are proposed.

Chemical Vapour Deposition

Автор: Xiu-Tian Yan; Yongdong Xu
Название: Chemical Vapour Deposition
ISBN: 1447125509 ISBN-13(EAN): 9781447125501
Издательство: Springer
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Цена: 26120.00 р.
Наличие на складе: Есть у поставщика Поставка под заказ.

Описание: Chemical Vapour Deposition explores the design capabilities and applications of advanced materials. From physical fundamentals to the optimization of processing parameters, this volume presents the development and manufacture of high performance materials.

Chemical Vapour Deposition

Автор: Xiu-Tian Yan; Yongdong Xu
Название: Chemical Vapour Deposition
ISBN: 1848828934 ISBN-13(EAN): 9781848828933
Издательство: Springer
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Цена: 26122.00 р.
Наличие на складе: Есть у поставщика Поставка под заказ.

Описание: Chemical Vapour Deposition explores the design capabilities and applications of advanced materials. From physical fundamentals to the optimization of processing parameters, this volume presents the development and manufacture of high performance materials.

Thin Films: Deposition Methods and Applications

Автор: Dongfang Yang
Название: Thin Films: Deposition Methods and Applications
ISBN: 1803564555 ISBN-13(EAN): 9781803564555
Издательство: Mare Nostrum (Eurospan)
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Цена: 20374.00 р.
Наличие на складе: Нет в наличии.

Описание: A thin film is a layer of material ranging from fractions of a nanometre to several micrometres in thickness. Thin films have been employed in many applications to provide surfaces that possess specific optical, electronic, chemical, mechanical and thermal properties. Through ten chapters consisting of original research studies and literature reviews written by experts from the international scientific community, this book covers the deposition and application of thin films.

Simple Chemical Methods for Thin Film Deposition

Автор: Sankapal
Название: Simple Chemical Methods for Thin Film Deposition
ISBN: 9819909600 ISBN-13(EAN): 9789819909605
Издательство: Springer
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Цена: 22359.00 р.
Наличие на складе: Есть у поставщика Поставка под заказ.

Описание: This book explores chemical methods for thin film deposition with diverse nanostructured morphology and their applications. Unlike top-down techniques, chemical methods offer low cost, simplicity, and growth of nanostructured surface architecture with ease of small to large-scale area deposition. The book primarily focuses on innovative twelve chemical methods for thin-film deposition on one platform. Since each method has its own advantages and disadvantages, it is crucial to select the specific method for specific material to be deposited depending upon what type of application is targeted. Due to inclusive of diverse chemical deposition methods, researcher will have knowledge about best choice of the deposition method to be adopted. Inclusive methods discussed in the book are chemical bath deposition, successive ionic layer adsorption and reaction, ion exchange, electroless deposition, electrodeposition, hydrothermal, spray pyrolysis, spin coating, dip coating, doctor blade, screen printing, and sol-gel. The selection of the correct procedure for material to be deposited in thin film form depends on its unique process parameters based on the kind of application and its requirement. The role of preparative factors necessary for thin film alters properties related to structure and surface morphology, electrical conductivity and optical band gap which have been extensively discussed along with the underlying science of film synthesis. The book provides a comprehensive overview of the field of chemical methods for thin film synthesis to applications. In addition to synthesis, the book covers characterization, instrumentation, and industrial application of thin films. As a result, concentrated techniques will be of great interest to university/college professors, students and new engineers as well as postdocs and scientists in the area.

Nanophotonic Fabrication

Автор: Takashi Yatsui
Название: Nanophotonic Fabrication
ISBN: 3642438423 ISBN-13(EAN): 9783642438424
Издательство: Springer
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Цена: 15672.00 р.
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Описание: In this book, the authors present a self-assembly method for size- and position-controlled ultra-long nanodot chains using a novel effect of near-field optical desorption, and also describe a novel deposition and etching scheme under nonresonant conditions.

Thin-Film Deposition: Principles and Practice

Автор: Donald Smith
Название: Thin-Film Deposition: Principles and Practice
ISBN: 0070585024 ISBN-13(EAN): 9780070585027
Издательство: McGraw-Hill
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Цена: 19561.00 р.
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Описание: Offers a complete description of the theory and technology of thin film deposition. This book offers a broad perspective, and gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. It also includes a list of symbols and an extensive index.

Chemical Vapor Deposition Polymerization

Автор: Jeffrey B. Fortin; Toh-Ming Lu
Название: Chemical Vapor Deposition Polymerization
ISBN: 1441954139 ISBN-13(EAN): 9781441954138
Издательство: Springer
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Цена: 16977.00 р.
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Deposition of Diamond-Like Superhard Materials

Автор: Wilhelm A.M. Kulisch
Название: Deposition of Diamond-Like Superhard Materials
ISBN: 366215627X ISBN-13(EAN): 9783662156278
Издательство: Springer
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Цена: 13974.00 р.
Наличие на складе: Есть у поставщика Поставка под заказ.

Описание: This book deals with the deposition of a certain class of materials, namely the diamond-like superhard materials, in the form of thin films. Starting from concepts used to improve the hardness of a material, it is shown that the intrinsic hardness is highest for materials with low bond lengths, high coordination numbers, and low ionicities.

Ion Implantation Range and Energy Deposition Distributions

Автор: K. Bruce Winterbon
Название: Ion Implantation Range and Energy Deposition Distributions
ISBN: 1475756143 ISBN-13(EAN): 9781475756142
Издательство: Springer
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Цена: 13974.00 р.
Наличие на складе: Есть у поставщика Поставка под заказ.

Metal Sprays and Spray Deposition

Автор: Henein Hani, Uhlenwinkel Volker, Fritsching Udo
Название: Metal Sprays and Spray Deposition
ISBN: 3319849638 ISBN-13(EAN): 9783319849638
Издательство: Springer
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Цена: 23757.00 р.
Наличие на складе: Есть у поставщика Поставка под заказ.

Описание: This book describes and illustrates metal spray and spray deposition from the process engineering, metallurgical, and application viewpoints. The authors include step-by-step fundamental information for the metal spray process and detail current engineering developments and applications.

Magneto Luminous Chemical Vapor Deposition

Автор: Yasuda
Название: Magneto Luminous Chemical Vapor Deposition
ISBN: 1138072095 ISBN-13(EAN): 9781138072091
Издательство: Taylor&Francis
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Цена: 16078.00 р.
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Описание:

The magneto luminous chemical vapor deposition (MLCVD) method is the perfect example of the "front-end green process." It employs an entirely new process that expends the minimum amount of materials in gas phase, yields virtually no effluent, and therefore requires no environmental remediation. Unlike the "back-end green process," which calls for add-on processes to deal with effluent problems, the newer MLCVD approach is a completely different phenomenon that has never been adequately described, until now.

Dispelling previous misconceptions and revealing new areas for investigation, Magneto Luminous Chemical Vapor Deposition describes the key process of dielectric breakdown of gas molecules under the influence of a magnetic field. It emphasizes behavioral distinctions between molecular gasses that cause plasma polymerization (such as methane and trimethylsilane) and mono-atomic gases (e.g., helium and argon) when dealing with the dielectric breakdown of the gas phase under low pressure. The author also reveals his minimum perturbation theory of biocompatibility. This is based on the realization that nanofilms prepared using MLCVD have unique, stable interfacial characteristics necessary to achieve a surface that can be tolerated in various biological environments.

The author presents alternating views based on NASA's recent discovery that a magnetic field burst from the earth triggers the inception of the aurora borealis. Detailing similarities between this phenomenon and the inception of the magneto luminous gas phase described in this book, the author proposes that proof of the one occurrence could shed light on the other. Expanding on the author's previous works, this book introduces new discoveries, highlights the newfound errors of previous assumptions, and juxtaposes many cutting-edge alternative views and anomalies associated with the field.


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