Rotating Machinery, Optical Methods & Scanning LDV Methods, Volume 6, Christopher Niezrecki; Javad Baqersad; Dario Di Ma
Автор: Rivera George Название: Rotating Machinery Handbook: Volume I ISBN: 1632384035 ISBN-13(EAN): 9781632384034 Издательство: Неизвестно Цена: 24943.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Автор: Jie Shan, Charles K. Toth (Editors) Название: Topographic laser ranging and scanning ISBN: 1498772277 ISBN-13(EAN): 9781498772273 Издательство: Taylor&Francis Рейтинг: Цена: 33686.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: This book provides a comprehensive discussion of topographic LiDAR principles, systems, data acquisition, and data processing techniques. Ranging and scanning fundamentals, and broad, contemporary analysis of airborne LiDAR systems, as well as those situated on land and in space are covered.
Описание: Since its development by Murakami, the corrosion cast method for scanning electron microscopy has come to be considered one of the most efficient means in clarifying the three-dimensional features of the microcirculation of organs and tissues.
Автор: Bharat Bhushan; Harald Fuchs Название: Applied Scanning Probe Methods IV ISBN: 364206597X ISBN-13(EAN): 9783642065972 Издательство: Springer Рейтинг: Цена: 23757.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Scanning Probe Lithography for Chemical, Biological and Engineering Applications.- Nanotribological Characterization of Human Hair and Skin Using Atomic Force Microscopy (AFM).- Nanofabrication with Self-Assembled Monolayers by Scanning Probe Lithography.- Fabrication of Nanometer-Scale Structures by Local Oxidation Nanolithography.- Template Effects of Molecular Assemblies Studied by Scanning Tunneling Microscopy (STM).- Microfabricated Cantilever Array Sensors for (Bio-)Chemical Detection.- Nano-Thermomechanics: Fundamentals and Application in Data Storage Devices.- Applications of Heated Atomic Force Microscope Cantilevers.
Автор: Bharat Bhushan; Harald Fuchs; Masahiko Tomitori Название: Applied Scanning Probe Methods X ISBN: 3642093426 ISBN-13(EAN): 9783642093425 Издательство: Springer Рейтинг: Цена: 27245.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: The volumes VIII, IX and X examine the physical and technical foundation for recent progress in applied scanning probe techniques. The field is progressing so fast that there is a need for a set of volumes every 12 to 18 months to capture latest developments. These volumes constitute a timely comprehensive overview of SPM applications.
Автор: Bharat Bhushan; Harald Fuchs; Satoshi Kawata Название: Applied Scanning Probe Methods V ISBN: 3642072119 ISBN-13(EAN): 9783642072116 Издательство: Springer Рейтинг: Цена: 23751.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: The volumes V, VI and VII will examine the physical and technical foundation for recent progress in applied scanning probe techniques. The chapters are written by leading researchers and application scientists from all over the world and from various industries to provide a broader perspective.
Автор: Bharat Bhushan Название: Scanning Probe Microscopy in Nanoscience and Nanotechnology 2 ISBN: 3662506017 ISBN-13(EAN): 9783662506011 Издательство: Springer Рейтинг: Цена: 28732.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: The chapters in this volume relate to scanning probe microscopy techniques, characterization of various materials and structures and typical industrial applications, including topographic and dynamical surface studies of thin-film semiconductors, polymers, paper, ceramics, and magnetic and biological materials.
Автор: Joseph Goldstein; Dale Newbury; David Joy; Joseph Название: Scanning Electron Microscopy and X-Ray Microanalysis ISBN: 149396674X ISBN-13(EAN): 9781493966745 Издательство: Springer Рейтинг: Цена: 13974.00 р. Наличие на складе: Поставка под заказ.
Описание: This thoroughly revised and updated Fourth Edition of a time-honored text provides the reader with a comprehensive introduction to the field of scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS) for elemental microanalysis, electron backscatter diffraction analysis (EBSD) for micro-crystallography, and focused ion beams. Students and academic researchers will find the text to be an authoritative and scholarly resource, while SEM operators and a diversity of practitioners - engineers, technicians, physical and biological scientists, clinicians, and technical managers - will find that every chapter has been overhauled to meet the more practical needs of the technologist and working professional. In a break with the past, this Fourth Edition de-emphasizes the design and physical operating basis of the instrumentation, including the electron sources, lenses, detectors, etc.
In the modern SEM, many of the low level instrument parameters are now controlled and optimized by the microscope's software, and user access is restricted. Although the software control system provides efficient and reproducible microscopy and microanalysis, the user must understand the parameter space wherein choices are made to achieve effective and meaningful microscopy, microanalysis, and micro-crystallography. Therefore, special emphasis is placed on beam energy, beam current, electron detector characteristics and controls, and ancillary techniques such as energy dispersive x-ray spectrometry (EDS) and electron backscatter diffraction (EBSD).
With 13 years between the publication of the third and fourth editions, new coverage reflects the many improvements in the instrument and analysis techniques. The SEM has evolved into a powerful and versatile characterization platform in which morphology, elemental composition, and crystal structure can be evaluated simultaneously. Extension of the SEM into a "dual beam" platform incorporating both electron and ion columns allows precision modification of the specimen by focused ion beam milling.
New coverage in the Fourth Edition includes the increasing use of field emission guns and SEM instruments with high resolution capabilities, variable pressure SEM operation, theory, and measurement of x-rays with high throughput silicon drift detector (SDD-EDS) x-ray spectrometers. In addition to powerful vendor- supplied software to support data collection and processing, the microscopist can access advanced capabilities available in free, open source software platforms, including the National Institutes of Health (NIH) ImageJ-Fiji for image processing and the National Institute of Standards and Technology (NIST) DTSA II for quantitative EDS x-ray microanalysis and spectral simulation, both of which are extensively used in this work. However, the user has a responsibility to bring intellect, curiosity, and a proper skepticism to information on a computer screen and to the entire measurement process.
This book helps you to achieve this goal. Realigns the text with the needs of a diverse audience from researchers and graduate students to SEM operators and technical managersEmphasizes practical, hands-on operation of the microscope, particularly user selection of the critical operating parameters to achieve meaningful resultsProvides step-by-step overviews of SEM, EDS, and EBSD and checklists of critical issues for SEM imaging, EDS x-ray microanalysis, and EBSD crystallographic measurementsMakes extensive use of open source software: NIH ImageJ-FIJI for image processing and NIST DTSA II for quantitative EDS x-ray microanalysis and EDS spectral simulation. Includes case studies to illustrate practical problem solvingCovers Helium ion scanning microscopyOrganized into relatively self-contained modules - no need to "read it all" to understand a topicIncludes an online supplement-an extensive "Database of Electron-Solid Interactions"-which can be accessed on SpringerLink, in Chapter 3
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