Автор: Friedrich Kremer; Alois Loidl Название: The Scaling of Relaxation Processes ISBN: 3030102548 ISBN-13(EAN): 9783030102548 Издательство: Springer Рейтинг: Цена: 20962.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: The dielectric properties especially of glassy materials are nowadays explored at widely varying temperatures and pressures without any gap in the spectral range from µHz up to the Infrared, thus covering typically 20 decades or more. This extraordinary span enables to trace the scaling and the mutual interactions of relaxation processes in detail, e.g. the dynamic glass transition and secondary relaxations, but as well far infrared vibrations, like the Boson peak. Additionally the evolution of intra-molecular interactions in the course of the dynamic glass transition is also well explored by (Fourier Transform) Infrared Spectroscopy. This volume within 'Advances in Dielectrics' summarizes this knowledge and discusses it with respect to the existing and often competing theoretical concepts.
Описание: Other topics covered include a study of some simple one dimensional basis sets and the presentation of two methods for band structure calculation using localized basis sets, both of which have important implications for the use of localized basis sets within LS-DFT.
Автор: Jonathan Worstell Название: Scaling Chemical Processes ISBN: 012804635X ISBN-13(EAN): 9780128046357 Издательство: Elsevier Science Рейтинг: Цена: 5051.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание:
"Scaling Chemical Processes: Practical Guides in Chemical Engineering" is one of a series of short texts that each provides a focused introductory view on a single subject. The full library spans the main topics in the chemical process industries for engineering professionals who require a basic grounding in various related topics. They are pocket publications that the professional engineer can easily carry with them or access electronically while working. Each text is highly practical and applied, and presents first principles for engineers who need to get up to speed in a new area fast.
The focused facts provided in each guide will help you converse with experts in the field, attempt your own initial troubleshooting, check calculations, and solve rudimentary problems. This book discusses scaling chemical processes from a laboratory through a pilot plant to a commercial plant. It bases scaling on similarity principles and uses dimensional analysis to derive the dimensionless parameters necessary to ensure a successful chemical process development program. This series is fully endorsed and co-branded by the IChemE, and they help to promote the series. Offers practical, short, concise information on the basics to help you get an answer or teach yourself a new topic quicklyIncludes industry examples to help you solve real world problemsProvides key facts for professionals in convenient single subject volumesDiscusses scaling chemical processes from a laboratory through a pilot plant to a commercial plant"
Автор: Robert Zale?ny; Manthos G. Papadopoulos; Paul G. M Название: Linear-Scaling Techniques in Computational Chemistry and Physics ISBN: 9400735561 ISBN-13(EAN): 9789400735569 Издательство: Springer Рейтинг: Цена: 46118.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: This text systematically reviews recent developments in linear-scaling methods and their applications in computational chemistry and physics. Heavy emphasis is placed on the theoretical aspects of linear-scaling methods.
Автор: Thompson Название: Transistor Scaling ISBN: 1558998691 ISBN-13(EAN): 9781558998698 Издательство: Cambridge Academ Рейтинг: Цена: 5069.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. This book shares results and physical models related to MOSFETs and to discuss innovative approaches necessary to continue the transistor scaling. Expanded versions of presentations in the areas of technology development are featured
Автор: Zdenek P. Bazant; Y. Rajapakse Название: Fracture Scaling ISBN: 0792358252 ISBN-13(EAN): 9780792358251 Издательство: Springer Рейтинг: Цена: 30606.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: A collection of the papers given at the workshop on Fracture Scaling, held at the University of Maryland, USA, 10-12 June 1999, under the sponsorship of the Office of Naval Research, Arlington, VA, USA. It is of interest to researchers and advanced graduate students in materials science, solid mechanics and civil engineering.
Описание: This monograph gives a detailed introductory exposition of research results for various models, mostly two-dimensional, of directed walks, interfaces, wetting, surface adsorption (of polymers), stacks, compact clusters (lattice animals), etc.
Описание: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Автор: F. M. Borodich Название: IUTAM Symposium on Scaling in Solid Mechanics ISBN: 9048180554 ISBN-13(EAN): 9789048180554 Издательство: Springer Рейтинг: Цена: 22201.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Constitutes the Proceedings of the IUTAM Symposium on `Scaling in Solid Mechanics`, held in Cardiff from 25th to 29th June 2007. The Symposium was convened to address and place on record topical issues in theoretical, experimental and computational aspects of scaling approaches to solid mechanics and related fields.
Описание: This proceedings volume contains papers presented at Symposium I, `Materials for End-of-Roadmap Scaling of CMOS Devices`, and Symposium J, `Materials and Devices for Beyond CMOS Scaling`, held April 5-9 at the 2010 MRS Spring Meeting in San Francisco, California. These symposia attracted 106 presentations, of which twenty-two were invited.
Описание: This proceedings volume contains papers presented at Symposium I, `Materials for End-of-Roadmap Scaling of CMOS Devices`, and Symposium J, `Materials and Devices for Beyond CMOS Scaling`, held April 5-9 at the 2010 MRS Spring Meeting in San Francisco, California. These symposia attracted 106 presentations, of which twenty-two were invited.
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