Описание: Fundamental Principles of Optical Lithography: The Science of Microfabrication presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. This sole-authored text includes optional computer simulation exercises as well as problems at the end of each chapter.
Описание: With hundreds of explanatory figures and tables, this volume deals with the latest achievements in hot areas such as nanofabrication and nanotechnology, with multi-disciplinary results on promising low-cost, high-throughput nanostructure manufacturing methods.
Описание: Written by the head of materials science and engineering at MIT, this concise and stringent introduction takes readers from the fundamental theory, via experimentation, to in-depth knowledge. A must-have for both beginners and veterans in the field.
Автор: Hyongsok T. Soh; Kathryn Wilder Guarini; Calvin F. Название: Scanning Probe Lithography ISBN: 0792373618 ISBN-13(EAN): 9780792373612 Издательство: Springer Рейтинг: Цена: 23757.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Describes advances in the field of scanning probe lithography, a high resolution patterning technique that uses a sharp tip in close proximity to a sample to pattern nanometer-scale features on the sample. This book describes the historical context, the relevant inventions, and the prospects for eventual manufacturing use of this technology.
Автор: Hyongsok T. Soh; Kathryn Wilder Guarini; Calvin F. Название: Scanning Probe Lithography ISBN: 1441948945 ISBN-13(EAN): 9781441948946 Издательство: Springer Рейтинг: Цена: 23757.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Scanning Probe Lithography (SPL) describes recent advances in the field of scanning probe lithography, a high resolution patterning technique that uses a sharp tip in close proximity to a sample to pattern nanometer-scale features on the sample.
Автор: Bei Yu; David Z. Pan Название: Design for Manufacturability with Advanced Lithography ISBN: 3319203843 ISBN-13(EAN): 9783319203843 Издательство: Springer Рейтинг: Цена: 11179.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).
Автор: Wayne M. Moreau Название: Semiconductor Lithography ISBN: 1461282284 ISBN-13(EAN): 9781461282280 Издательство: Springer Рейтинг: Цена: 16979.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography.
Автор: Bei Yu; David Z. Pan Название: Design for Manufacturability with Advanced Lithography ISBN: 3319373935 ISBN-13(EAN): 9783319373935 Издательство: Springer Рейтинг: Цена: 11179.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).
Автор: Robinson, Alex Название: Materials and Processes for Next Generation Lithography,11 ISBN: 0081003544 ISBN-13(EAN): 9780081003541 Издательство: Elsevier Science Рейтинг: Цена: 22738.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. . These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. . This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication.
Автор: Kamil A. Valiev Название: The Physics of Submicron Lithography ISBN: 1461364612 ISBN-13(EAN): 9781461364610 Издательство: Springer Рейтинг: Цена: 27950.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer.
Автор: Ozel Название: Coaxial Lithography ISBN: 3319454137 ISBN-13(EAN): 9783319454139 Издательство: Springer Рейтинг: Цена: 15672.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: This thesis focuses on the electrochemical synthesis of multi-segmented nanowires. In contrast to previous work, which was largely limited to one-dimensional modifications, Tuncay Ozel presents a technique, termed coaxial Lithography (COAL), which allows for the synthesis of coaxial nanowires in a parallel fashion with sub-10 nanometer resolution in both the axial and radial dimensions. This work has significantly expanded current synthetic capabilities with respect to materials generality and the ability to tailor two-dimensional growth in the formation of core-shell structures. These developments have enabled fundamental and applied studies which were not previously possible. The COAL technique will increase the capabilities of many researchers who are interested in studying light-matter interactions, nanoparticle assembly, solution-dispersible nanoparticles and labels, semiconductor device physics and nanowire biomimetic probe preparation. The methodology and results presented in this thesis appeal to researchers in nanomaterial synthesis, plasmonics, biology, photovoltaics, and photocatalysis.
Описание: With hundreds of explanatory figures and tables, this volume deals with the latest achievements in hot areas such as nanofabrication and nanotechnology, with multi-disciplinary results on promising low-cost, high-throughput nanostructure manufacturing methods.
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