Physical Design and Mask Synthesis for Directed Self-Assembly Lithography, Seongbo Shim; Youngsoo Shin
Автор: Jingsong Wei Название: Laser Heat-Mode Lithography ISBN: 9811509425 ISBN-13(EAN): 9789811509421 Издательство: Springer Рейтинг: Цена: 13974.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: This book provides a systematic description and analysis of laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer, while also presenting typical experimental results and applications. It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength. Laser heat-mode lithography techniques greatly simplify production procedures because they require neither a particular light source nor a particular environment; further, there are no pre-baking and post-baking steps required for organic photoresists. The pattern feature size can be either larger or smaller than the laser spot by adjusting the writing strategy. The lithographic feature size can also be arbitrarily tuned from nanoscale to micrometer without changing the laser spot size. Lastly, the line edge roughness can be controlled at a very low value because the etching process is a process of breaking bonds among atoms. The book offers an invaluable reference guide for all advanced undergraduates, graduate students, researchers and engineers working in the fields of nanofabrication, lithography techniques and systems, phase change materials, etc.
Описание: This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
Автор: Bei Yu; David Z. Pan Название: Design for Manufacturability with Advanced Lithography ISBN: 3319373935 ISBN-13(EAN): 9783319373935 Издательство: Springer Рейтинг: Цена: 11179.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).
Автор: Bei Yu; David Z. Pan Название: Design for Manufacturability with Advanced Lithography ISBN: 3319203843 ISBN-13(EAN): 9783319203843 Издательство: Springer Рейтинг: Цена: 11179.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).
Автор: Wayne M. Moreau Название: Semiconductor Lithography ISBN: 1461282284 ISBN-13(EAN): 9781461282280 Издательство: Springer Рейтинг: Цена: 16979.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography.
Автор: Hyongsok T. Soh; Kathryn Wilder Guarini; Calvin F. Название: Scanning Probe Lithography ISBN: 1441948945 ISBN-13(EAN): 9781441948946 Издательство: Springer Рейтинг: Цена: 23757.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Scanning Probe Lithography (SPL) describes recent advances in the field of scanning probe lithography, a high resolution patterning technique that uses a sharp tip in close proximity to a sample to pattern nanometer-scale features on the sample.
Автор: Kamil A. Valiev Название: The Physics of Submicron Lithography ISBN: 1461364612 ISBN-13(EAN): 9781461364610 Издательство: Springer Рейтинг: Цена: 27950.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer.
Описание: With hundreds of explanatory figures and tables, this volume deals with the latest achievements in hot areas such as nanofabrication and nanotechnology, with multi-disciplinary results on promising low-cost, high-throughput nanostructure manufacturing methods.
Описание: With hundreds of explanatory figures and tables, this volume deals with the latest achievements in hot areas such as nanofabrication and nanotechnology, with multi-disciplinary results on promising low-cost, high-throughput nanostructure manufacturing methods.
Автор: Clivia M. Sotomayor Torres Название: Alternative Lithography ISBN: 1461348366 ISBN-13(EAN): 9781461348368 Издательство: Springer Рейтинг: Цена: 20962.00 р. Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today `s wealth, would have been a source of inspiration five hundred years later.
Описание: Fundamental Principles of Optical Lithography: The Science of Microfabrication presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. This sole-authored text includes optional computer simulation exercises as well as problems at the end of each chapter.
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